MICROPOSIT S1800 G2 series photoresist are positive photoresist systems engineered to satisfy the microelectronics industry’s requirements for IC device fabrication. The system has been engineered using a toxico- logically – safer alternative casting solvent to the ethylene glycol derived ether acetates.
- Optimized for g-line & i-line exposure
- Effective for broadband exposure
- Excellent adhesion ( Improved with SP )
- PFOS / PFOA – free
- Optimized for use with MF-319 metal-ion-free developer family
- Compatible with metal-ion-bearing developers