Photo-curable NIL resist
mr-NIL200 is a photo-curable NIL resist specifically for applying hard and non-permeable stamp materials. The typical application field of mr-NIL200 is the use as an etch mask in pattern transfer processes for e.g. photonic applications. mr-NIL200 works without the need for any additional adhesion promoter or primer.
Unique Features
- No need for additional adhesion promoter or primer proved on different substrates (Si, SiO2, Al, sapphire, Cu, different underlayer materials like LOR, UL1, UL3)
- Can be cured under ambient conditions in the presence of air
- Low viscosity renders fast cavitity filling and minimize propensity for air bubble defects
Application Examples
Step-and-repeat nanoimprint on pre-spin coated film for the fabrication of integrated optical devices
G Calafiore et al., J. Micro/Nanolith. MEMS MOEMS 14(3), 033506 Link to Abstract
Efficient fabrication of photonic and optical patterns by imprinting the tailored photo-curable NIL resist «mr-NIL200»
M Messerschmidt et al., Poster, International Conference on Micro & Nano Engineering MNE2018, Copenhagen Link to Poster
UV-NIL
Resist | Film Thickness [nm] spin coating @ 3000 rpm |
Recommended working stamp material | Special Feature |
mr-NIL200-100nm | 100 | non-porous | No primer required, r.t. process |
mr-NIL200-200nm | 200 | ||
mr-NIL200-300nm | 300 |
Film thickness and packages size
Specifications | Film thickness and packages sizes |
Ready to use solutions for standard film thickness (3000 rpm) | mr-NIL200-100 nm mr-NIL200-200 nm mr-NIL200-300 nm |
Customized film thickness upon request between (3000 rpm) | 1 µm |
Availalbe resist quantities | 250 ml 500 ml Larger volumes on request |