micro resist technology GmbH – leader in the development, production and distribution of innovative photoresists, polymers and photopolymers
micro resist technology was established in 1993 and is an owner-managed company with more than 50 employees. The corporate office incl. the development department, the manufacturing and logistics as well as its own application clean room on 300sqm is located in Berlin, Germany. The company is successfully certified according to the standards: ISO 9001:2015 und ISO 14001:2015.
micro resist technology GmbH is one of the world’s leading companies for innovative photoresists, polymers and photopolymers and offers a wide range of specialized products for the key technologies of today and the growth markets of tomorrow.
We are a leading company in the development and production of innovative photoresists, polymers and photopolymers as well as complementary process chemicals for lithographic manufacturing processes in micro- and nanostructuring. Our products are used in key technologies and growth markets such as microsystems technology, microelectronics, optoelectronics, micro- and nanophotonics, micro- and nanotechnology as well as the life sciences. We face up to our customers’ demands for technology solutions and materials that will also meet future generations through sustainability. The success of micro resist technology GmbH is driven the commitment and profound know-how of our employees who develop, produce and market the innovative products and services.
Our global customers are innovative manufacturing companies where micro and nano manufacturing is part of their essential added value. Our customers also include leading research institutions and universities, which we support in the early phase of their technology development. Customers of all kinds appreciate our core competence in dealing with photoresists, polymers and photopolymers as well as the comprehensive technological advice with a holistic view of the lithographic interaction of material and process. Our goal is to have satisfied and enthusiastic customers who are promptly successful in their processes. As a reliable and experienced partner, we also offer product-related lithographic services.
As Resist Alliance we see ourselves as a single entry point for specialty chemicals used in micro and nano manufacturing. Thus, we complement the portfolio of our in-house products with the strategic sales of associated products from other international manufacturers *. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.
* DuPont, Kayaku Advanced Materials, DJ Microlaminates
Since the company was founded in 1993 in Berlin, we have been producing specialized materials for the global high-tech markets, in which processes such as UV, laser, X-ray and electron beam lithography, nanoimprint lithography and associated structuring technologies are used. In a continuous innovation process, we expand our product portfolio and also develop customer-specific solutions of the highest quality. We have been certified according to DIN EN ISO 9001 (quality management system) since 1997 and since 2011 according to DIN EN ISO 14001 (environmental management system).
micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.
DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)
We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.
Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)
We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.
DJ MicroLaminates, Inc.
We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.
Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.
Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process
micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.
OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436
Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography
Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography
Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.
micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.
Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!