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mr-NIL210 series
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Unique Features

  • Excellent curing properties, even under air (presence of oxygen)
  • Compatibility to PDMS working stamps for soft-NIL, preferably applied in combination with UV-PDMS KER-4690 
  • Outstanding dry etch stability against various substrates like silicon, quartz, or aluminum
  • Purely organic resist, residue-free removable with oxygen plasma possible after curing
Application examples

Applications

  • Etch mask for pattern transfer processes (dry and wet etching)
  • Fabrication of nanostructures for
    • LEDs, photonic crystals
    • Patterned sapphire substrates (PSS)
    • Microelectronics
    • Organic electronics (OLED, OPV, OTFT)
    • Data storage (bit patterned media)
    • Lift-off applications in combination with  e.g. LOR (MCC, USA)
mr-NIL210 is a purely organic, photo-curable NIL resist with oustanding dry etch characteristics. It features an excellent curing and nanoimprint performance and is particularly suitable for soft-NIL using soft stamp materials, e.g. PDMS.
Photo-curable NIL-Resist

Recommended process parameters

Process step Process parameter
Spin coating 3000 rpm for 30 s
Prebake 60 °C for 180 s
Imprint temperature Room temperature
Imprint pressure > 100 mbar
Radiation intensity mr-NIL210-100nm: 100 mW cm-2
mr-NIL210-200nm: 50 mW cm-2
mr-NIL210-500nm: 50 mW cm-2
Radiation source Option 1: broad band
Option 2: LED (365-405 nm)
Thinner mr-T 1078
Primer mr-APS1
Omnicoat (Kayaku Advanced Materials)
Recommended process chemicals:
Thinner mr-T 1078
Primer mr-APS1

Omnicoat (Kayaku Advanced Materials)

quotation request

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New Organic Photo-Curable Nanoimprint Resist «mr-NIL210» for High Volume Fabrication Applying Soft PDMS-Based Stamps
M Messerschmidt et al., Journal of Photopolymer Science and Technology, Volume 30, Number 5 (2017) 6 0 5 -6 1 1
Link: https://www.jstage.jst.go.jp/article/photopolymer/30/5/30_605/_article/-char/en

UV-NIL based nanostructuring of aluminum using a novel organic imprint resist demonstrated for 100 nm half-pitch wire grid polarizer
F Schlachter et al., Microelectronic Engineering Volume 155, 2 April 2016, Pages 118-121
https://www.sciencedirect.com/science/article/abs/pii/S0167931716301587

Nanoindentation of crystalline silicon pillars fabricated by soft UV nanoimprint lithography and cryogenic deep reactive ion etching
G Hamdana et al., Sensors and Actuators A: Physical Volume 283, 1 November 2018, Pages 65-78
Link: https://www.sciencedirect.com/science/article/abs/pii/S092442471830102X

Hybridpolymere
How to make a working stamp in a simple setup using OrmoStamp®
According to the requirements of imprinting, OrmoStamp® was designed for the simple and cost-effective manufacture of transparent polymer working stamps with excellent pattern fidelity from micro- to nanometer regime. It can be used for both thermal and UV imprinting and therefore is ideally suited to replace silicon and quartz molds.
Hybrid polymers
OrmoStamp®
UV-imprint
NIL
NIL materials
Working stamp fabrication
Micro optics
Wafer-level-optics
22. June 2021
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Positivresist
How to perform greyscale lithography in thick films using ma-P 1275G
Greyscale patterning of positive resists of the ma-P 1200G series is an excellent method for the manufacturing of 3D structures. These photoresist structures are used as template for subsequent pattern transfer, e.g. by Metallization and electroplating, UV moulding with OrmoStamp® and OrmoComp® or thermal moulding with PDMS, Dry etching.
Positive Photoresist
Greyscale lithography
Mikrooptics
Wafer-level-optics
ma-P 1200G series
22. June 2021
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Negativresist
Fabrication of phase-gradient meta-surfaces consisting of high AR ma-N 2400 patterns
Fabrication of phase-gradient meta-surfaces consisting of high AR ma-N 2400 patterns
Electron beam lithography using highly sensitive negative tone ma-N 2400 resist in combination with critical point drying enables the direct fabrication of phase-gradient meta-surfaces. This cost-effective alternative material platform and fabrication method effectively reduces the required fabrication to a single lithography step and removes any subsequent need for material deposition, lift-off, or etching.
Negativresist
E-Beam Lithography
Nano- und Mikroelektronik
Permanentanwendung
ma-N 2400
14. Juli 2020
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Inkjet-Materialien
Functional Materials for Inkjet-printing
Functional Materials for Inkjet-printing
micro resist technology offers functional materials for Inkjet-printing. The materials have been specially designed to exhibit a good compatibility to a broad range of inkjet printing tools. The portfolio involves two classes of products providing ideal solutions for the manufacture of micro and nano optical components or functional films. InkOrmo and InkEpo exhibit excellent optical properties as well as high chemical, mechanical and thermal stability. mr-UVCur26SF is solvent-free material which has been specifically designed for nanoimprint lithography (NIL).
Inkjet Materials
Inkjet-printing
3D microstructures
Nano and micro electronics
Wire-grid polarizers
Diffractive optical elements (DOE)
Organic electronics
InkOrmo series
InkEpo series
mr-UVCur26SF series
30. Juni 2020
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Positivresist, Hybridpolymere
Manufacturing Microlens Arrays by Reflow and UV Moulding
Manufacturing Microlens Arrays by Reflow and UV Moulding
A cost-efficient method for the manufacturing of micro lens arrays is the reflow of patterned positive resists ma-P 1200G or ma-P 1200 and subsequent pattern transfer using OrmoStamp® or OrmoComp®.
Positive Photoresists
Hybrid Polymers
Thermal reflow
3D microstructures
Mikro Optiken
Wafer-level-optics
ma-P 1200 series / ma-P 1275HV
ma-P 1200G series
OrmoStamp
OrmoComp
23. Juni 2020
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Negativresist, Hybridpolymere
Core and Clad Systems fo Optical Waveguides
Core and Clad Systems fo Optical Waveguides
micro resist technology provides various materials for the fabrication of optical waveguides: OrmoCore/OrmoClad and EpoCore/EpoClad.micro resist technology provides various materials for the fabrication of optical waveguides: OrmoCore/OrmoClad and EpoCore/EpoClad.
Negative Photoresists
Hybrid Polymers
UV-Lithography
Optical waveguide
Polymer based waveguides
EpoCore & EpoClad series
OrmoCore & OrmoClad
23. Juni 2020
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Element 32
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Resist Alliance

micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.

DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)

We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.

Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)

We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.

DJ MicroLaminates, Inc.

We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.

Dry Films

Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.

  • Available in different film thicknesses
  • UV-crosslinking as negative photoresist
  • Feasibility of high aspect ratios
  • Vertical sidewalls
  • Multi lamination possible – up to 6 layer  complex multi-layer designs
  • High chemical resilience

 

  • Application as permanent material for optical application (e.g. lenses, wave guides …), in micro fluidics

Functional materials for inkjet-printing

Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process

  • Available in different viscosities (adjustable)
  • Suitable in commercial inkjet printing devices
  • Focused on high reliability of droplet generation
  • UV-curable formulations

 

  • Usable as a permanent material for optical application (e.g. lenses, wave guides, optical couplers, diffractive elements, …)
  • Packaging material in the micro electronic
  • Deposition / patterning on substrates with surface topography
  • Imprint material for nano-structuring with high dose accuracy

Nanoimprint Resists

Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.

micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!

Hybrid Polymers

micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.

OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436

Positive Photoresists

Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography

  • Variety of viscosities for 0.1 µm – 60 µm film thickness in one spin-coating step
  • Effective for broadband, g-line, h-line or i-line exposure, laser direct writing at 350…450 nm and e-beam lithography
  • No post exposure bake
  • Easy removal
     
  • For pattern transfer: Etch mask, mould for electroplating, mould for UV moulding
  • Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. MEMS, LEDs, ICs, MOEMS, fiber optics telecommunications devices, flat panel displays

Negative Photoresists

Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography

  • Effective for broadband and i-line, Deep UV, e-beam exposure, or laser direct writing @ 405 nm
  • Lift-off resists with tunable pattern profile, high temperature stability up to 160 °C
  • Variety of viscosities for different film thicknesses in one spin-coating step
     
  • For pattern transfer: Physical vapour deposition (PVD) and single  layer lift-off, etch mask, mould for electroplating
  • For permanent applications: Polymeric waveguides
  • Use in microsystems technology, microelectronics, micro-optics  – manufacture of e.g. LEDs, ICs, MEMS, flat panel displays, fiber optics telecommunications devices