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Prozesschemikalien

ma-T 1045
Thinner
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Anja Voigt
E-Mail: a.voigt@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist, NIL
Suitable Resists:
mr-EBL 6000 series, mr-PosEBR series, mr-I PMMA35k series, mr-I 9000M series, mr-NIL 6000E series
Clear
ma-T 1046
Thinner
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist
Suitable Resists:
ma-N 1400 series
Clear
ma-T 1050
Thinner
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Anja Voigt
E-Mail: a.voigt@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist, Hybrid Polymers, NIL
Suitable Resists:
ma-P 1200G series, ma-P 1200 series/ ma-P 1275HV, ma-P 1200LIL series, OrmoClear®FX, OrmoClear® series, OrmoComp®, OrmoCore & OrmoClad, OrmoStamp®, mr-I 7000R series, mr-I 8000R series, SIPOL series, mr-XNIL26SF
Clear
mr-T 1049
Thinner
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist
Suitable Resists:
ma-N 400 series
Clear
mr-T 1070
Thinner
micro resist technology
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Manuel Thesen
E-Mail: m.thesen@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
NIL
Clear
mr-T 1075
Thinner
micro resist technology
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Manuel Thesen
E-Mail: m.thesen@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
NIL
Suitable Resists:
mr-NIL210 series, mr-NIL200 series
Clear
mr-T 1078
Thinner
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Manuel Thesen
E-Mail: m.thesen@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
NIL
Suitable Resists:
mr-NIL210 series, mr-NIL200 series
Clear
mr-T 1090
Thinner
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Anja Voigt
E-Mail: a.voigt@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist
Suitable Resists:
ma-N 2400 series
Clear
OrmoThin
Thinner
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Jan Klein
E-Mail: j.klein@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Hybrid Polymers
Suitable Resists:
OrmoClear®FX, OrmoClear® series, OrmoComp®, OrmoCore & OrmoClad, OrmoStamp®
Characteristics
Solvent based, NMP free NEP free
Clear
HMDS-Primer
Adhesion Promoter
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Anja Voigt
E-Mail: a.voigt@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist
Suitable Resists:
ma-N 400 series, ma-N 1400 series, ma-P 1200G series, ma-P 1200 series/ ma-P 1275HV, ma-P 1200LIL series
Clear
mr-Primer 80/20
Adhesion Promoter
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Anja Voigt
E-Mail: a.voigt@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist
Suitable Resists:
ma-N 2400 series, ma-N 400 series, ma-N 1400 series, ma-P 1200G series, ma-P 1200 series/ ma-P 1275HV, ma-P 1200LIL series
Clear
SurPass 3000
Adhesion Promoter
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Anja Voigt
E-Mail: a.voigt@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist
Clear
SurPass 4000
Adhesion Promoter
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Anja Voigt
E-Mail: a.voigt@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist
Suitable Resists:
ma-N 2400 series, ma-N 400 series, ma-N 1400 series, ma-P 1200G series, ma-P 1200 series/ ma-P 1275HV, ma-P 1200LIL series
Clear
OrmoPrime®08
Adhesion Promoter
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Jan Klein
E-Mail: j.klein@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Hybrid Polymers
Suitable Resists:
OrmoClear®FX, OrmoClear® series, OrmoComp®, OrmoCore & OrmoClad, OrmoStamp®
Characteristics
Aqueous-alkaline, NMP free NEP free
Clear
mr-APS1
Adhesion Promoter
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Manuel Thesen
E-Mail: m.thesen@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
NIL
Suitable Resists:
mr-NIL210 series, mr-XNIL26SF
Clear
ma-D 331
Developer
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Anja Voigt
E-Mail: a.voigt@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist
Suitable Resists:
ma-N 2400 series, ma-P 1200G series, ma-P 1200 series/ ma-P 1275HV
Characteristics
NaOH based, Aqueous-alkaline, metal ion bearing
Clear
ma-D 331/S
Developer
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Anja Voigt
E-Mail: a.voigt@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist
Suitable Resists:
ma-N 400 series, ma-P 1200G series, ma-P 1200 series/ ma-P 1275HV
Characteristics
NaOH based, Aqueous-alkaline, metal ion bearing
Clear
ma-D 332
Developer
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist
Suitable Resists:
ma-N 2400 series
Characteristics
NaOH based, Aqueous-alkaline, metal ion bearing
Clear
ma-D 332/S
Developer
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist
Suitable Resists:
ma-N 400 series
Characteristics
NaOH based, Aqueous-alkaline, metal ion bearing
Clear
ma-D 374/S
Developer
micro resist technology
Contact Person
Anja Hinz
E-Mail: a.hinz@microresist.de
Phone: +49 30 64 16 70 100
Anja Voigt
E-Mail: a.voigt@microresist.de
Phone: +49 30 64 16 70 100
Element 25weqwf
Applications
Resist
Suitable Resists:
ma-P 1200LIL series
Characteristics
Aqueous-alkaline, Metasilcate based, metal ion bearing
Clear
1 2 3 4

If you have not found a product or desired information, please do not hesitate to contact us directly. Please use the general contact on this website or a contact person from our sales team, as far as the cross-link is given. We will come back to you immediately.

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Element 32
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Resist Alliance

micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.

DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)

We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.

Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)

We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.

DJ MicroLaminates, Inc.

We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.

Contact Person

Franziska Kopp

DuPont Electronics & Imaging Products

E-Mail: f.kopp@microresist.de

Phone: +49 30 64 16 70 100

Dr. Anja Voigt

Kayaku Advanced Materials, DJ Mikrolaminates

E-Mail: a.voigt@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

Kayaku Advanced Materials, DJ Mikrolaminates

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Dry Films

Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.

  • Available in different film thicknesses
  • UV-crosslinking as negative photoresist
  • Feasibility of high aspect ratios
  • Vertical sidewalls
  • Multi lamination possible – up to 6 layer  complex multi-layer designs
  • High chemical resilience

 

  • Application as permanent material for optical application (e.g. lenses, wave guides …), in micro fluidics

Contact Person

Carsten Schröder

E-Mail: c.schroeder@microresist.de

Phone: +49 30 64 16 70 100

Element 23weqwf

Functional materials for inkjet-printing

Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process

  • Available in different viscosities (adjustable)
  • Suitable in commercial inkjet printing devices
  • Focused on high reliability of droplet generation
  • UV-curable formulations

 

  • Usable as a permanent material for optical application (e.g. lenses, wave guides, optical couplers, diffractive elements, …)
  • Packaging material in the micro electronic
  • Deposition / patterning on substrates with surface topography
  • Imprint material for nano-structuring with high dose accuracy

Contact Person

Dr. Anja Voigt

E-Mail: a.voigt@microresist.de

Phone: +49 30 64 16 70 100

Dr. Jan Klein

E-Mail: j.klein@microresist.de

Phone: +49 30 64 16 70 100

Element 23weqwf

Hybrid Polymers

micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.

OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436

Contact Person

Dr. Jan Klein

E-Mail: j.klein@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Element 23weqwf

Positive Photoresists

Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography

  • Variety of viscosities for 0.1 µm – 60 µm film thickness in one spin-coating step
  • Effective for broadband, g-line, h-line or i-line exposure, laser direct writing at 350…450 nm and e-beam lithography
  • No post exposure bake
  • Easy removal
     
  • For pattern transfer: Etch mask, mould for electroplating, mould for UV moulding
  • Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. MEMS, LEDs, ICs, MOEMS, fiber optics telecommunications devices, flat panel displays

Contact Person

Dr. Christine Schuster

E-Mail: c.schuster@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Element 23weqwf

Negative Photoresists

Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography

  • Effective for broadband and i-line, Deep UV, e-beam exposure, or laser direct writing @ 405 nm
  • Lift-off resists with tunable pattern profile, high temperature stability up to 160 °C
  • Variety of viscosities for different film thicknesses in one spin-coating step
     
  • For pattern transfer: Physical vapour deposition (PVD) and single  layer lift-off, etch mask, mould for electroplating
  • For permanent applications: Polymeric waveguides
  • Use in microsystems technology, microelectronics, micro-optics  – manufacture of e.g. LEDs, ICs, MEMS, flat panel displays, fiber optics telecommunications devices

Contact Person

Dr. Anja Voigt

E-Mail: a.voigt@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Element 23weqwf

Nanoimprint Resists

Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.

micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!

Contact Person

Dr. Manuel Thesen

E-Mail: m.thesen@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Element 23weqwf