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info@microresist.de

News

In this area you can find the latest news from micro resist technology. We always keep you up to date on new research projects, conferences, and we regularly publish our tech blog.

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conference
Online Symposium on Direct Write, Optical, Ion and Electron Beam Lithography
Online Symposium on Direct Write, Optical, Ion and Electron Beam Lithography
We would like to announce proudly the next event of the “Symposium on Direct Write, Optical, Ion and Electron Beam Lithography”...
03.12.2020
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information
Joining EU’s Graphene Flagship Initiative
Joining EU’s Graphene Flagship Initiative
We are very happy to become part of the largest research initiatives funded by the European Commission...
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Digital HoliFAB conference
Digital HoliFAB conference
As partner of the project consortium we would like to announce HoliFAB’s first digital conference taking place on Nov 5th 2020...
05.11.2020
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Information
Operational Update
Current information on COVID-19
During the global pandemic of COVID-19, we at micro resist technology GmbH make our necessary contribution to the mandatory...
Berlin, 02.11.2020
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information
Partnership with DJ MicroLaminates
Partnership with DJ MicroLaminates
micro resist technology GmbH and DJ MicroLaminates reaffirm their longstanding partnership...
July 2020
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Tech-Blog
Fabrication of phase-gradient meta-surfaces consisting of high AR ma-N 2400 patterns
Fabrication of phase-gradient meta-surfaces consisting of high AR ma-N 2400 patterns
Electron beam lithography using highly sensitive negative tone ma-N 2400 resist in combination with critical...
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Tech-Blog
Functional Materials for Inkjet-printing
Functional Materials for Inkjet-printing
micro resist technology offers functional materials for Inkjet-printing. The materials have been specially designed to...
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Tech-Blog
Manufacturing Microlens Arrays by Reflow and UV Moulding
Manufacturing Microlens Arrays by Reflow and UV Moulding
A cost-efficient method for the manufacturing of micro lens arrays is the reflow of patterned positive...
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Tech-Blog
Core and Clad Systems fo Optical Waveguides
Core and Clad Systems fo Optical Waveguides
micro resist technology provides various materials for the fabrication of optical waveguides...
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Tech-Blog
Optical 3D patterning by greyscale lithography and UV moulding
Optical 3D patterning by greyscale lithography and UV moulding
An excellent method for the manufacturing of optical 3D structures is grayscale patterning of positive resist ma-P 1200G...
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Tech-Blog
Product-supporting Lithographic Services
Product-supporting Lithographic Services
We offer lithographic services and application engineering to support our customers finding tailored process solutions...
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Tech-Blog
3D optical micro structures via two-photon polymerization (2PP)
3D optical micro structures via two-photon polymerization (2PP)
The two-photon polymerization is an excellent method for the manufacturing of individually designed (optical)...
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Tech-Blog
Fabrication of 3D patterns by means of Two-Photon-Polymerization
Fabrication of 3D patterns by means of Two-Photon-Polymerization
Two-photon-polymerization (2PP) is a cost-efficient method to fabricate individually shaped 3D patterns...
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Tech-Blog
Homogeneous resist coating of substrates with topography
Homogeneous resist coating of substrates with topography
Spray coating is a material-saving method for the homogeneous resist coating of substrates, especially...
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Tech-Blog
Fabrication of sub-µm-patterns by Deep UV lithography using ma-N 2400
Fabrication of sub-µm-patterns by Deep UV lithography using ma-N 2400
Deep UV exposure using highly sensitive negative tone ma-N 2400 resists is a method for the generation of sub-µm patterns...
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Publications
Grayscale positive photoresist
Grayscale positive photoresist
Grayscale lithography creates 3D film profiles with gradually varying thickness1, see Fig.1. The grayscale...
11.05.2020
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conference
SPIE Advanced Lithography
SPIE Advanced Lithography
We are pleased to announce our participation in the SPIE Advanced Lithography 2020 in San Jose, California...
23 - 27 February 2020
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conference
Symposium on Nanolithography
Symposium on Nanolithography
Symposium on Nanolithography ~ 18./19.02.2020 in Stuttgart - As in the last years we would like to invite you...
18./19.02.2020
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conference
SPIE Photonics West 2020
SPIE Photonics West 2020
We are pleased to announce our participation in the SPIE Photonics West 2020 in San Francisco, California 01-06 February.
01 - 06 February 2020
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conference
SEMICON EUROPA 2019
SEMICON EUROPA 2019
In November from 12th to 15th the Semicon Europe Exhibition will take place in Munich, Germany...
12 - 15 November 2019
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Resist Alliance
MicroChem Corp. (MCC) changed its name
MicroChem Corp. (MCC) changed its name
In September 2019 the 45th International Conference on Micro & Nano Engineering will be held in Rhodes Greece...
September 23. – 26. 2019
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conference
TRANSDUCERS 2019 in Berlin – Germany
TRANSDUCERS 2019 in Berlin - Germany
Proudly we announce our participation at TRANSDUCERS 2019 – EUROSENSORS XXXIII in Berlin
23 - 27 June 2019
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conference
ENRIS • Enschede NL
ENRIS • Enschede NL
The European Nanofabrication Research Infrastructure Symposium (ENRIS) 2019 is the 2nd edition of the...
17 - 18 June 2019
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conference
OSA – Optical Design and Fabrication Congress
OSA - Optical Design and Fabrication Congress
We are pleased to announce our participation in the 2019 Optical Design and Fabrication Congress, to be held at OSA Headquarters...
10 - 12. June 2019
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conference
20th CMi Annual Review Meeting
20th CMi Annual Review Meeting
We are pleased to announce our participation in the 20th CMi Annual Review Meeting on Tuesday May 7th, 2019 at the EPFL in Lausanne...
Tuesday May 7th, 2019
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Element 32
0

Resist Alliance

micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.

DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)

We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.

Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)

We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.

DJ MicroLaminates, Inc.

We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.

Contact Person

Franziska Kopp

DuPont Electronics & Imaging Products

E-Mail: f.kopp@microresist.de

Phone: +49 30 64 16 70 100

Dr. Anja Voigt

Kayaku Advanced Materials, DJ Mikrolaminates

E-Mail: a.voigt@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

Kayaku Advanced Materials, DJ Mikrolaminates

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Dry Films

Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.

  • Available in different film thicknesses
  • UV-crosslinking as negative photoresist
  • Feasibility of high aspect ratios
  • Vertical sidewalls
  • Multi lamination possible – up to 6 layer  complex multi-layer designs
  • High chemical resilience

 

  • Application as permanent material for optical application (e.g. lenses, wave guides …), in micro fluidics

Contact Person

Carsten Schröder

E-Mail: c.schroeder@microresist.de

Phone: +49 30 64 16 70 100

Functional materials for inkjet-printing

Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process

  • Available in different viscosities (adjustable)
  • Suitable in commercial inkjet printing devices
  • Focused on high reliability of droplet generation
  • UV-curable formulations

 

  • Usable as a permanent material for optical application (e.g. lenses, wave guides, optical couplers, diffractive elements, …)
  • Packaging material in the micro electronic
  • Deposition / patterning on substrates with surface topography
  • Imprint material for nano-structuring with high dose accuracy

Contact Person

Dr. Anja Voigt

E-Mail: a.voigt@microresist.de

Phone: +49 30 64 16 70 100

Dr. Jan Klein

E-Mail: j.klein@microresist.de

Phone: +49 30 64 16 70 100

Nanoimprint Resists

Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.

micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!

Contact Person

Dr. Manuel Thesen

E-Mail: m.thesen@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Hybrid Polymers

micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.

OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436

Contact Person

Dr. Jan Klein

E-Mail: j.klein@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Positive Photoresists

Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography

  • Variety of viscosities for 0.1 µm – 60 µm film thickness in one spin-coating step
  • Effective for broadband, g-line, h-line or i-line exposure, laser direct writing at 350…450 nm and e-beam lithography
  • No post exposure bake
  • Easy removal
     
  • For pattern transfer: Etch mask, mould for electroplating, mould for UV moulding
  • Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. MEMS, LEDs, ICs, MOEMS, fiber optics telecommunications devices, flat panel displays

Contact Person

Dr. Christine Schuster

E-Mail: c.schuster@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Negative Photoresists

Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography

  • Effective for broadband and i-line, Deep UV, e-beam exposure, or laser direct writing @ 405 nm
  • Lift-off resists with tunable pattern profile, high temperature stability up to 160 °C
  • Variety of viscosities for different film thicknesses in one spin-coating step
     
  • For pattern transfer: Physical vapour deposition (PVD) and single  layer lift-off, etch mask, mould for electroplating
  • For permanent applications: Polymeric waveguides
  • Use in microsystems technology, microelectronics, micro-optics  – manufacture of e.g. LEDs, ICs, MEMS, flat panel displays, fiber optics telecommunications devices

Contact Person

Dr. Anja Voigt

E-Mail: a.voigt@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100