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NNT (2024) NIL ID – Save-the-date
NNT (2024) NIL ID – Save-the-date
This year, 2024, we will join forces and merge the NNT 2024, the 23rd International Conference on Nanoimprint and Nanoprint Technologies, and the European NIL Industrial Day 2024, the 14th summit focusing on industrial applications of Nanoimprint Lithography, to be held as a united conference on June 24-27, 2024, at ”The Medicon Village” in Lund, Sweden.
21. June 2024
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micro resist technology

We are leaders in the development, production and sale of innovative photoresists, polymers, photopolymers and ancillaries for micro- and nanostructuring processes used in key technologies of today and growth markets of tomorrow.

What's next:

NNT (2024) NIL ID – Save-the-date
This year, 2024, we will join forces and merge the NNT 2024, the 23rd International Conference on Nanoimprint and Nanoprint Technologies, and the European NIL Industrial Day 2024, the 14th summit focusing on industrial applications of Nanoimprint Lithography, to be held as a united conference on June 24-27, 2024, at ”The Medicon Village” in Lund, Sweden.

mrt Resists & Photopolymers

Ancillaries

Negative Photoresists

Our negative photoresists are used for UV-, DUV, e-beam and X-ray lithography as well as for laser direct writing …

Positive Photoresists

Our positive photoresists are used in UV lithography (mask aligner, laser direct writing, greyscale exposure)…

Hybrid Polymers

Our UV-curable hybrid polymers are used for the manufacture of polymer-based micro- and nano-optics …

Nanoimprint Resists / Polymers

Our tailor-made resist formulations are used in different technologies of nanoimprint lithography (NIL) …

Inkjet Materials

Our inkjet materials from all product groups are suitable in highly diverse applications using inkjet printing processes …

Dry Film Photoresist

Our dry film resists are used as a permanent material in optical applications and micro fluidics …

As a high-service distributor, we also offer complementary products from our partners in our own portfolio.

formerly DOW Chemical – formerly Rohm and Haas

formerly MicroChem MCC

For global high-tech markets

Innovative photoresists, polymers, photopolymers and process chemicals for micro- and nanolithography

News

In this area you can find the latest news from micro resist technology. We always keep you up to date on new research projects, conferences, and we regularly publish our tech blog.

Information
NNT (2024) NIL ID – Save-the-date
NNT (2024) NIL ID – Save-the-date
This year, 2024, we will join forces and merge the NNT 2024, the 23rd International Conference on Nanoimprint and Nanoprint Technologies, and the European NIL Industrial Day 2024, the 14th summit focusing on industrial applications of Nanoimprint Lithography, to be held as a united conference on June 24-27, 2024, at ”The Medicon Village” in Lund, Sweden.
21. June 2024
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NanoKorea
NanoKorea 2024 – July 3rd – 5th, 2024
We are proud to announce that we will be attending NanoKorea at KINTEX Exhibition Center I in the first week of July.
20. June 2024
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Join the mrt webinar series and meet the experts
Join the mrt webinar series and meet the experts
micro resist technology offers a free online seminar series „mrt webinar – meet the experts“ on a monthly base.
2. June 2024
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BioChip in Berlin
BioChip in Berlin
We will be presenting at BioChip in Berlin this year. Look forward with us to Dr. Maria Russew contribution. She will be speaking about one of our important research projects on Wednesday, May 29 at 14:25 p.m. on the topic: "PolyChrome – Photonics for sensing applications".
28. May 2024
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conference
SPIE Advanced Lithography + Patterning February 25th – 29th 2024
SPIE Advanced Lithography + Patterning February 25th – 29th 2024
We would like to proudly inform you that we will be at the SPIE-AL in San Jose California again this year. You are welcome to meet our experts in the technical exhibition at booth #538.
13. February 2024
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Visit from the Berlin Senator for Economic Affairs
Visit from the Berlin Senator for Economic Affairs
Franziska Giffey - Berlin's Senator for Economic Affairs - visited us on January 8, 2024 as part of the "Made in Berlin" tour of the year 2024...
11. January 2024
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Semicon Europa 2023, November 14 – 17
Semicon Europa 2023, November 14 - 17
We look forward to welcoming you - customers and partners - again at the SEMICON in Munich ...
11. October 2023
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Workshop PolyChrome Berlin
Workshop PolyChrome Berlin
We are pleased to announce our participation in the workshop PolyChrome Berlin on November 2nd
11. October 2023
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Nano-Micro-Lithography Symposium
Nano-Micro-Lithography Symposium
Nano-Micro-Lithography Symposium Save the date: November 6th/7th, 2023
11. October 2023
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NNT 2023, October 9 – 11
NNT 2023, October 9 – 11
We are looking forward to our participation in the NNT 2023 conference and exhibition. Taking place in Boston (USA) from October 9th – 11th...
4. October 2023
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MNE – Micro and Nano Engineering Conference 25. – 28.09.2023  in Berlin Germany
MNE - Micro and Nano Engineering Conference 25. - 28.09.2023 in Berlin Germany
We are pleased to inform you that we - micro resist technology GmbH - are the local conference organizers of this year’s MNE 2023 ...
14. June 2023
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Workshop Maskless Laser Lithography for the Advanced Micro- and Nanofabrication
Workshop Maskless Laser Lithography for the Advanced Micro- and Nanofabrication
Workshop Maskless Laser Lithography for the Advanced Micro- and Nanofabrication...
14. June 2023
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26th World’s Leading Trade Fair with Congress for Photonics Components, Systems and Applications<br>June 27–30, 2023 | Messe München
26th World’s Leading Trade Fair with Congress for Photonics Components, Systems and Applications June 27–30, 2023 | Messe München
We would like to announce that this year we will also be exhibiting at Laser World of Photonics in Munich.
14. June 2023
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NIL industrialday 2023
NIL industrialday 2023
Leading NIL experts will once again meet at the 2023 NIL Industrial Day...
26. February 2023
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Konferenz
SPIE Advanced Lithography + Patterning 26 February – 2 March 2023
SPIE Advanced Lithography + Patterning 26 February - 2 March 2023
We are very pleased that we will resume our international trade fair trips in 2023!
25. February 2023
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micro resist technology -30 years, a success story
micro resist technology -30 years, a success story
The 17th of February 2023 was a special day for micro resist technology GmbH...
25. February 2023
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Tech-Blogs

In our newly developed Tech-Blog we will inform you about technical novelties and innovations. In the form of short abstracts, we provide further information on application-related technology examples that have been implemented using our products and technologies.

Negativresist, Dry resists
Easy Application of dry films resist
Dry film resists allow the easy manufacture of resist films in a broad variety of thicknesses. This “How-to-use” video demonstrates the easy handling of dry resist films.
Dry film resists
negative resists
UV lithography
ADEX
SUEX
MX 5000
WBR 2000
MX 5000
micro fluidics
2D/ 2.5 micro patterns
pattern transfer processes
electroplating
permanent application
22.01.2024
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Hybridpolymere
New Prototypes in Hybrid Polymers
New Prototypes in Hybrid Polymers
Poly- and perfluorinated compounds have become notorious under the name “PFAS” in recent years peaking in a draft submitted to the ECHA (European chemistry agency) earlier this year to check for a comprehensive ban of fluorinated compounds.
Hybridpolymere
OrmoStamp®FF
OrmoStamp®
PFAS
UV-Replication
Inkjet Printing
InkOrmo
InkOrmoPRO
OrmoComp®
dispensing
Mikrooptiken
29.11.2023
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Negativresist
Lithography services: Fabrication of masters for microfluidics
Lithography services: Fabrication of masters for microfluidics
As part of our lithography services we provide since 2013 multi-layer master wafers for micro fluidic applications made of epoxy based resists...
Microfluidics
Negative resists
UV-Lithography
Lithography service
Soft lithography
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Negativresist, Negative Photoresists
Combined UV & e-beam lithography patterning in a mix & match approach in negative resists
Combined UV & e-beam lithography patterning in a mix & match approach in negative resists
The ongoing miniaturization of integrated circuits (IC‘s) and micro-electro-mechanical systems (MEMS) demands the fabrication of increasingly small and complex patterns with requirements for precision and resolution down to the nanometer scale.
Negative resists
UV Lithography
E-Beam lithography
Nano and Micro electronic
Dry etching
ma-N 1400
22. May 2023
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Negativresist, Negative Photoresists, Trockenresiste, Dry resists
Patterning of dry film resists in single or multilayer coatings
Patterning of dry film resists in single or multilayer coatings
Dry film resists allow the easy manufacture of resist films in a broad variety of thicknesses.
Dry resists
Negative resists
UV lithography
Pattern transfer processes
2D/ 2.5D micro patterns
Micro fluidic
Permanent application
Electroplating
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Nanoimprint
The beauties of Nanoimprint Lithography 2022
The beauties of Nanoimprint Lithography 2022
As 2022 draws to a close, we proudly highlight a major achievement that our nanoimprint lithography (NIL) group has accomplished this year in collaboration with two key players in the European NIL ecosystem.
Nanoimprint Resist
Nanoimprint Lithography
mr-NIL212FC
UV-NIL
Dry Etch Mask
SMILE Technology
SmartNIL Technology
19.12.2022
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Hybrid Polymers
Now available: Hybrid polymers in cartridges
Now available: Hybrid polymers in cartridges
micro resist technology GmbH is pleased to offer our customers a new container size for hybrid polymers. OrmoComp®, OrmoStamp®, OrmCore, OrmoClad as well as all products of the OrmoClear® series are now available in 55cc cartridges with standard Luer-Lock connector...
dispensingr
hybrid polymers
OrmoComp®, OrmoStamp®, OrmoClear®
cartridge
micro optics
09. September 2022
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Nanoimprint Resists
How to make an imprint in a simple manual setup using mr-NIL210
Soft UV-NIL is an excellent method to replicate nano patterns with a flexible soft working stamp on different kinds of substrates.
UV-NIL resist Replication of nano patterns soft working stamp manual imprinting UV-PDMS mr-NIL210 mr-NIL212FC
24. March 2022
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Nanoimprint, Nanoimprint Resists
mr-NIL212FC – Our latest product for UV nanoimprint lithography
mr-NIL212FC – Our latest product for UV nanoimprint lithography
micro resist technology GmbH is pleased to present a new product in the field of materials for nanoimprint lithography: mr-NIL212FC.
Nanoimprint Resist
Nanoimprint Lithography
UV-NIL
Soft UV-NIL
Dry Etch Mask
04. March 2022
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Hybrid Polymers, Negative Photoresists
3D micro structures via two-photon polymerization (2PP)
3D micro structures via two-photon polymerization (2PP)
The two-photon polymerization is an excellent method for the manufacturing of individually designed (optical) 3D micro structures with OrmoComp® or mr-DWL, which cannot obtained with conventional lithography techniques due to their complexity.
Negative Photoresists
Hybrid Polymers
Two-Photon Polymerization (2PP)
3D microstructures
Microfluidics and micro-bio-fluidics
Lab-on-a-Chip
OrmoComp
mr-DWL series
11. February 2022
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Hybrid Polymers
OrmoPrime20 – A new adhesion promoter for our Hybrid Polymers
OrmoPrime20 – A new adhesion promoter for our Hybrid Polymers
micro resist technology GmbH would like to announce the release of a new product: OrmoPrime20. OrmoPrime20 is an adhesion promoter based on organofunctional silanes.
Adhesion promoter
Hybrid polymers
Ancillaries
Adhesion promoter for Hybrid polymers
OrmoPrime20
24. January 2022
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Nanoimprint Resists
Ready-To-Use Spin-On Thin-Film COC Formulations For Permanent Applications
Ready-To-Use Spin-On Thin-Film COC Formulations For Permanent Applications
The chemical nature of Cyclic Olefin Copolymers (COCs) offers very unique material properties, making them not only attractive for the manufacturing of specialized injection moulded parts but also for several thin film applications.
Nanoimprint Resist
Bio-Applications
Lab-on-Chip
optical Polymer
Thin film-formulation Cycloolefin-Copolymer COC
mr-IT85
21. January 2022
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Hybrid Polymers
How to make a working stamp in a simple setup using OrmoStamp®
According to the requirements of imprinting, OrmoStamp® was designed for the simple and cost-effective manufacture of transparent polymer working stamps with excellent pattern fidelity from micro- to nanometer regime. It can be used for both thermal and UV imprinting and therefore is ideally suited to replace silicon and quartz molds.
Hybrid polymers
OrmoStamp®
UV-imprint
NIL
NIL materials
Working stamp fabrication
Micro optics
Wafer-level-optics
22. June 2021
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Positive Photoresists
How to perform greyscale lithography in thick films using ma-P 1275G
Greyscale patterning of positive resists of the ma-P 1200G series is an excellent method for the manufacturing of 3D structures. These photoresist structures are used as template for subsequent pattern transfer, e.g. by Metallization and electroplating, UV moulding with OrmoStamp® and OrmoComp® or thermal moulding with PDMS, Dry etching.
Positive Photoresist
Greyscale lithography
Micro Optics
Wafer-level-optics
ma-P 1200G series
22. June 2021
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Negative Photoresists
Fabrication of phase-gradient meta-surfaces consisting of high AR ma-N 2400 patterns
Fabrication of phase-gradient meta-surfaces consisting of high AR ma-N 2400 patterns
Electron beam lithography using highly sensitive negative tone ma-N 2400 resist in combination with critical point drying enables the direct fabrication of phase-gradient meta-surfaces. This cost-effective alternative material platform and fabrication method effectively reduces the required fabrication to a single lithography step and removes any subsequent need for material deposition, lift-off, or etching.
Negative Photoresists
E-Beam Lithography
Nano and micro electronics
Permanent application
ma-N 2400
14. Juli 2020
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Inkjet Materials
Functional Materials for Inkjet-printing
Functional Materials for Inkjet-printing
micro resist technology offers functional materials for Inkjet-printing. The materials have been specially designed to exhibit a good compatibility to a broad range of inkjet printing tools. The portfolio involves two classes of products providing ideal solutions for the manufacture of micro and nano optical components or functional films. InkOrmo and InkEpo exhibit excellent optical properties as well as high chemical, mechanical and thermal stability. mr-UVCur26SF is solvent-free material which has been specifically designed for nanoimprint lithography (NIL).
Inkjet Materials
Inkjet-printing
3D microstructures
Nano and micro electronics
Wire-grid polarizers
Diffractive optical elements (DOE)
Organic electronics
InkOrmo series
InkEpo series
mr-UVCur26SF series
30. Juni 2020
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Our Resellers

micro resist technology GmbH is proud to offer you a worldwide dealer network.

Element 32
0

Resist Alliance

micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.

DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)

We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.

Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)

We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.

DJ MicroLaminates, Inc.

We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.

Dry Films

Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.

  • Available in different film thicknesses
  • UV-crosslinking as negative photoresist
  • Feasibility of high aspect ratios
  • Vertical sidewalls
  • Multi lamination possible – up to 6 layer  complex multi-layer designs
  • High chemical resilience

 

  • Application as permanent material for optical application (e.g. lenses, wave guides …), in micro fluidics

Functional materials for inkjet-printing

Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process

  • Available in different viscosities (adjustable)
  • Suitable in commercial inkjet printing devices
  • Focused on high reliability of droplet generation
  • UV-curable formulations

 

  • Usable as a permanent material for optical application (e.g. lenses, wave guides, optical couplers, diffractive elements, …)
  • Packaging material in the micro electronic
  • Deposition / patterning on substrates with surface topography
  • Imprint material for nano-structuring with high dose accuracy

Nanoimprint Resists

Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.

micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!

Hybrid Polymers

micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.

OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436

Positive Photoresists

Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography

  • Variety of viscosities for 0.1 µm – 60 µm film thickness in one spin-coating step
  • Effective for broadband, g-line, h-line or i-line exposure, laser direct writing at 350…450 nm and e-beam lithography
  • No post exposure bake
  • Easy removal
     
  • For pattern transfer: Etch mask, mould for electroplating, mould for UV moulding
  • Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. MEMS, LEDs, ICs, MOEMS, fiber optics telecommunications devices, flat panel displays

Negative Photoresists

Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography

  • Effective for broadband and i-line, Deep UV, e-beam exposure, or laser direct writing @ 405 nm
  • Lift-off resists with tunable pattern profile, high temperature stability up to 160 °C
  • Variety of viscosities for different film thicknesses in one spin-coating step
     
  • For pattern transfer: Physical vapour deposition (PVD) and single  layer lift-off, etch mask, mould for electroplating
  • For permanent applications: Polymeric waveguides
  • Use in microsystems technology, microelectronics, micro-optics  – manufacture of e.g. LEDs, ICs, MEMS, flat panel displays, fiber optics telecommunications devices