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We are leaders in the development, production and sale of innovative photoresists, polymers, photopolymers and ancillaries for micro- and nanostructuring processes used in key technologies of today and growth markets of tomorrow.
Dear customers and business partners,
During the ongoing spread of COVID-19 we carry on our daily work with protection against infection and will continue to provide our services to the satisfaction of our customers. We have maintained the normal operational mode which allows regular processing of orders. Nothing changes for you in the order process.
We wish you all the best and look forward to further cooperation …
Your team of micro resist technology GmbH
formerly DOW Chemical – formerly Rohm and Haas
formerly MicroChem MCC
Dear customers, dear partners,
In the current times we also need positive news: Therefore, you are very welcome on the redesigned website of micro resist technology GmbH!
The pre-Socratic philosopher knew many centuries ago: “Nothing is as constant as change” (Heraclitus of Ephesus). Obliging this claim to innovation, we have renewed our presence on the Internet. The possibilities of digital communication are gaining in importance again these weeks, so that we are proud to look at the virtual shop window of our company.
Based on the positive feedback in the past we have integrated our well-tried contents. You will find in the future also a technical focus to our own products together with the products of our strategic partner. By integration of an intuitive filter functionality we were able to simplify the access to our product world in total. The aim is that you can reach faster an overview and still to select the right products very comfortable.
We would like to invite you to check out our new designed product world. The product world is living, mutable and will react to changing requirements. We will expand and adapt our portfolio so that the future visit is still worthwhile. Certainly we assist you personally.
Your team at micro resist technology
Innovative photoresists, polymers, photopolymers and process chemicals for micro- and nanolithography
In this area you can find the latest news from micro resist technology. We always keep you up to date on new research projects, conferences, and we regularly publish our tech blog.
micro resist technology GmbH is proud to offer you a worldwide dealer network.
micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.
DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)
We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.
Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)
We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.
DJ MicroLaminates, Inc.
We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.
Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.
Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process
Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.
micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.
Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!
micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.
OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436
Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography
Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography
