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News

In this area you can find the latest news from micro resist technology. We always keep you up to date on new research projects, conferences, and we regularly publish our tech blog.

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DisplayInnovatonDay_11Dec2024
Display Innovation Day on December 11th, 2024
Among many other exciting contributions, our expert Dr. Maria Russew will give a presentation on “Highly reliable hybrid polymer materials for micro-optical applications, photonics and beyond”
3. December 2024
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Join the mrt webinar series and meet the experts
micro resist technology offers a free online seminar series „mrt webinar – meet the experts“ on a monthly base.
1. November 2024
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Workshop "Beams & More" in Stuttgart
Our expert Dr. Alexander Plucinski will be there with his presentation on “Innovative Photopolymers Advancing Micro- and Nano Patterning for Photonic Applications”
31. October 2024
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Semicon Europa 2024, November 12 - 15
We would like to welcome you - customers and partners - again at SEMICON Europa hall C2, booth 746
10. October 2024
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PolyChrome Workshop – Berlin Adlershof – Curie-Cabinet – October 9th, 2024
We will contribute to this workshop with an expert presentation by Dr. Maria Russew about “Hybrid Polymers for Optical Applications and Beyond”.
25. September 2024
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MNE 2024 - September 16th - 19th, 2024
MRT will be attending MNE again this year - the 50th edition of the International Micro and Nano Engineering Conference from September 16th – 19th, 2024 in Montpellier, France
11. September 2024
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Technical Workshop - Montpellier - September 16th, 2024
In the run-up to the MNE conference in Montpellier, the Technical Workshop on Laser Lithography & Direct Write is taking place - organized by Heidelberg Instruments, GenISys, and micro resist technology.
10. September 2024
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NanoKorea 2024 – July 3rd – 5th, 2024
We are proud to announce that we will be attending NanoKorea at KINTEX Exhibition Center I in the first week of July.
22. June 2024
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NNT (2024) NIL ID – Save-the-date
This year, 2024, we will join forces and merge the NNT 2024, the 23rd International Conference on Nanoimprint and Nanoprint Technologies, and the European NIL Industrial Day 2024, the 14th summit focusing on industrial applications of Nanoimprint Lithography, to be held as a united conference on June 24-27, 2024, at ”The Medicon Village” in Lund, Sweden.
21. June 2024
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BioChip in Berlin
We will be presenting at BioChip in Berlin this year. Look forward with us to Dr. Maria Russew contribution. She will be speaking about one of our important research projects on Wednesday, May 29 at 14:25 p.m. on the topic: "PolyChrome – Photonics for sensing applications".
28. May 2024
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SPIE Advanced Lithography + Patterning February 25th – 29th 2024
We would like to proudly inform you that we will be at the SPIE-AL in San Jose California again this year. You are welcome to meet our experts in the technical exhibition at booth #538.
13. February 2024
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Visit from the Berlin Senator for Economic Affairs
Franziska Giffey - Berlin's Senator for Economic Affairs - visited us on January 8, 2024 as part of the "Made in Berlin" tour of the year 2024...
11. January 2024
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Semicon Europa 2023, November 14 - 17
We look forward to welcoming you - customers and partners - again at the SEMICON in Munich ...
11. October 2023
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Workshop PolyChrome Berlin
We are pleased to announce our participation in the workshop PolyChrome Berlin on November 2nd
11. October 2023
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Nano-Micro-Lithography Symposium
Nano-Micro-Lithography Symposium Save the date: November 6th/7th, 2023
11. October 2023
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NNT 2023, October 9 – 11
We are looking forward to our participation in the NNT 2023 conference and exhibition. Taking place in Boston (USA) from October 9th – 11th...
4. October 2023
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MNE - Micro and Nano Engineering Conference 25. - 28.09.2023 in Berlin Germany
We are pleased to inform you that we - micro resist technology GmbH - are the local conference organizers of this year’s MNE 2023 ...
14. June 2023
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Workshop Maskless Laser Lithography for the Advanced Micro- and Nanofabrication
Workshop Maskless Laser Lithography for the Advanced Micro- and Nanofabrication...
14. June 2023
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26th World’s Leading Trade Fair with Congress for Photonics Components, Systems and Applications June 27–30, 2023 | Messe München
We would like to announce that this year we will also be exhibiting at Laser World of Photonics in Munich.
14. June 2023
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NIL industrialday 2023
Leading NIL experts will once again meet at the 2023 NIL Industrial Day...
26. February 2023
Konferenz
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SPIE Advanced Lithography + Patterning 26 February - 2 March 2023
We are very pleased that we will resume our international trade fair trips in 2023!
25. February 2023
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micro resist technology -30 years, a success story
The 17th of February 2023 was a special day for micro resist technology GmbH...
25. February 2023
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SEMICON EUROPA, 15 - 18 November 2022 Munich, Germany
We are very pleased to be able to welcome you to our booth again this year...
7. October 2022
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NMLS22
NMLS Nano-Micro-Lithography Symposium, October 19th/20th, 2022
Joint Symposium on Direct Write, Optical, Ion and Electron Beam Lithography
7. October 2022
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Workshop - Maskless Laser Lithography for Advanced Micro- and Nanofabrication, September 19
We especially invite you to the talk of our expert Dr. Arne Schleunitz on “Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication”...
31. August 2022
Element 32
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Resist Alliance

micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.

DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)

We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.

Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)

We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.

DJ MicroLaminates, Inc.

We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.

Dry Films

Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.

  • Available in different film thicknesses
  • UV-crosslinking as negative photoresist
  • Feasibility of high aspect ratios
  • Vertical sidewalls
  • Multi lamination possible – up to 6 layer  complex multi-layer designs
  • High chemical resilience

 

  • Application as permanent material for optical application (e.g. lenses, wave guides …), in micro fluidics

Functional materials for inkjet-printing

Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process

  • Available in different viscosities (adjustable)
  • Suitable in commercial inkjet printing devices
  • Focused on high reliability of droplet generation
  • UV-curable formulations

 

  • Usable as a permanent material for optical application (e.g. lenses, wave guides, optical couplers, diffractive elements, …)
  • Packaging material in the micro electronic
  • Deposition / patterning on substrates with surface topography
  • Imprint material for nano-structuring with high dose accuracy

Nanoimprint Resists

Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.

micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!

Hybrid Polymers

micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.

OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436

Positive Photoresists

Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography

  • Variety of viscosities for 0.1 µm – 60 µm film thickness in one spin-coating step
  • Effective for broadband, g-line, h-line or i-line exposure, laser direct writing at 350…450 nm and e-beam lithography
  • No post exposure bake
  • Easy removal
     
  • For pattern transfer: Etch mask, mould for electroplating, mould for UV moulding
  • Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. MEMS, LEDs, ICs, MOEMS, fiber optics telecommunications devices, flat panel displays

Negative Photoresists

Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography

  • Effective for broadband and i-line, Deep UV, e-beam exposure, or laser direct writing @ 405 nm
  • Lift-off resists with tunable pattern profile, high temperature stability up to 160 °C
  • Variety of viscosities for different film thicknesses in one spin-coating step
     
  • For pattern transfer: Physical vapour deposition (PVD) and single  layer lift-off, etch mask, mould for electroplating
  • For permanent applications: Polymeric waveguides
  • Use in microsystems technology, microelectronics, micro-optics  – manufacture of e.g. LEDs, ICs, MEMS, flat panel displays, fiber optics telecommunications devices