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In this area you can find the latest news from micro resist technology. We always keep you up to date on new research projects, conferences, and we regularly publish our tech blog.

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Join the mrt webinar series and meet the experts
Join the mrt webinar series and meet the experts
micro resist technology offers a free online seminar series „mrt webinar – meet the experts“ on a monthly base.
13. April 2022
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NIL Industrialday June 14th – 15th 2022 – The leading Conference for Nanoimprint Lithography and its Applications
NIL Industrialday June 14th – 15th 2022 - The leading Conference for Nanoimprint Lithography and its Applications
We are happy to announce that the next NILIndustrial Day 2022 will take place on June 14th – 15th 2022 as a fully remote summit...
13. April 2022
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May 09, 2022 – Technical Workshop (in-person) on Maskless Laser Lithography and NanoFrazor® Patterning for Advanced 2D and 3D Biomedical Devices
May 09, 2022 - Technical Workshop (in-person) on Maskless Laser Lithography and NanoFrazor® Patterning for Advanced 2D and 3D Biomedical Devices
Heidelberg Instruments and micro resist technology GmbH are jointly organizing this technical workshop focusing on systems and applications in biomedical technology...
12. April 2022
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May 05, 2022 – IVAM High-Tech Summit 2022 – Solutions for Sustainability
May 05, 2022 - IVAM High-Tech Summit 2022 - Solutions for Sustainability
We will participate in this year’s IVAM High-Tech Summit as business partner...
12. April 2022
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Managing Director Gabi Grützner was awarded the Federal Cross of Merit
Managing Director Gabi Grützner was awarded the Federal Cross of Merit
On February 17th, 2022, our founder and managing director Mrs. Gabi Grützner received the Federal Cross of Merit with ribbon from Stephan Schwarz, Senator for Economics, Energy and Enterprises in Berlin.
21. February 2022
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White Paper: Advancing greyscale lithography and pattern transfer of 2.5D structures using maP 1200G resist series
White Paper: Advancing greyscale lithography and pattern transfer of 2.5D structures using maP 1200G resist series
In our second White Paper we focus on greyscale lithography...
19. January 2022
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SEMICON EUROPA, 16 – 19 November 2021 Munich, Germany
SEMICON EUROPA, 16 - 19 November 2021 Munich, Germany
We are at the SEMICON EUROPA in Munich! ...
12. October 2021
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NMLS Nano-Micro-Lithography Symposium, November 4h, 2021
NMLS Nano-Micro-Lithography Symposium, November 4h, 2021
Join us for the Symposium, hosted on gather.town. ...
12. October 2021
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NNT 2021, the 20th International Conference on Nanoimprint and Nanoprint Technologies (16.-17.11.2021)
NNT 2021, the 20th International Conference on Nanoimprint and Nanoprint Technologies (16.-17.11.2021)
We are happy to present our recent R&D activities virtually on the upcoming 20th International Conference on Nanoimprint and Nanoprint Technologies...
12. October 2021
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MNC 2021, October 26-29, Online and On-demand, 34th International Microprocesses and Nanotechnology Conference
MNC 2021, October 26-29, Online and On-demand, 34th International Microprocesses and Nanotechnology Conference
We are more than happy to present our recent R&D activities again far abroad in Japan ...
27. September 2021
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Workshop on PolyChrome Technology Platform: Photonics for Sensing – October 5th, 2021
Workshop on PolyChrome Technology Platform: Photonics for Sensing – October 5th, 2021
We gladly announce our participation in the upcoming Photonics Days Berlin Brandenburg ...
27. September 2021
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MNE Micro and Nano Engineering Conference – Turin, Italy – September 20th – 23rd, 2021
MNE Micro and Nano Engineering Conference - Turin, Italy - September 20th - 23rd, 2021
The MNE is back this year and we will be again part of it! Visit us at our virtual booth in the expo area to learn about new material developments and new releases...
19. August 2021
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Workshop on Maskless Laser Lithography & Direct Writing for Nano- and Microfabrication – September 20 th, 2021
Workshop on Maskless Laser Lithography & Direct Writing for Nano- and Microfabrication - September 20 th, 2021
We are pleased that the series of events “Maskless Laser Lithography and Direct Writing for Nano- and Microfabrication” will be continued within the framework of the MNE conference...
19. August 2021
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NMLS Nano-Micro-Lithography Symposium, June 30th, 2021
NMLS Nano-Micro-Lithography Symposium, June 30th, 2021
At this point we would like to draw your attention to the next edition of the “Nano-Micro-Lithography Symposium“ ...
16. June 2021
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virtual NIL INDUSTRIAL DAY 2021
virtual NIL INDUSTRIAL DAY 2021
We completed our preparations for this year’s virtual NIL INDUSTRIAL DAY 2021 and are now looking forward to an unique selection of exciting presentations.
16. June 2021
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White Paper: Cyclic Olefin Copolymer (COC) Formulation for the Fabrication of Sub-Micron Thin Films
White Paper: Cyclic Olefin Copolymer (COC) Formulation for the Fabrication of Sub-Micron Thin Films
We are very happy to announce the start of our new white paper series...
27. May 2021
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conference
EIPBN Electron, Ion, and Photon Beam Technology and Nanofabrication
EIPBN Electron, Ion, and Photon Beam Technology and Nanofabrication
We are pleased to announce our participation in the virtual EIPBN conference on...
23. April 2021
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Special issue “Nanoimprint Lithography Technology and Applications”
Special issue “Nanoimprint Lithography Technology and Applications”
We are pleased to announce that our work on a “novel concept of Micro Patterned Micro Titer Plates Fabricated via UV-NIL for...
28. March 2021
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EPIC’s Online Technology Meeting on Moulded Optics
EPIC’s Online Technology Meeting on Moulded Optics
We will participate in EPIC’s Online Technology Meeting on Moulded Optics on Monday, 3 May 2021
12. March 2021
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Online Symposium “Functional Coatings, Manufacturing, Metrology & Application”
Online Symposium “Functional Coatings, Manufacturing, Metrology & Application”
We are pleased to announce our participation in the online symposium “Functional Coatings, Manufacturing, Metrology & Application” organized by the TH Wildau on the 9th of March.
25. February 2021
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NNCI Advanced Lithography UnSymposium @ Stanford University
NNCI Advanced Lithography UnSymposium @ Stanford University
We proudly announce our participation with two presentations in the virtual, interactive online event organized by our partners Raith and Heidelberg Instruments...
14. January 2021
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conference
Virtual Exhibition and Conference PHOTONICS+
Virtual Exhibition and Conference PHOTONICS+
Committed to develop the most efficient and effective photonics virtual exhibition and conference, our partner EPIC – European Photonics Industry consortium – is organizing...
20. December 2020
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Greetings at the end of the year
Important information
Dear customers, partners and friends, An unprecedented year is coming to an end!
4. December 2020
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Interview on the EU project NextGenMicrofluidics
Interview on the EU project NextGenMicrofluidics
We are very pleased about our contribution in the current cluster newsletter for optical technologies and microsystem technology...
3. December 2020
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Online Symposium on Direct Write, Optical, Ion and Electron Beam Lithography
Online Symposium on Direct Write, Optical, Ion and Electron Beam Lithography
We would like to announce proudly the next event of the “Symposium on Direct Write, Optical, Ion and Electron Beam Lithography”...
2. December 2020
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Element 32
0

Resist Alliance

micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.

DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)

We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.

Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)

We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.

DJ MicroLaminates, Inc.

We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.

Dry Films

Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.

  • Available in different film thicknesses
  • UV-crosslinking as negative photoresist
  • Feasibility of high aspect ratios
  • Vertical sidewalls
  • Multi lamination possible – up to 6 layer  complex multi-layer designs
  • High chemical resilience

 

  • Application as permanent material for optical application (e.g. lenses, wave guides …), in micro fluidics

Functional materials for inkjet-printing

Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process

  • Available in different viscosities (adjustable)
  • Suitable in commercial inkjet printing devices
  • Focused on high reliability of droplet generation
  • UV-curable formulations

 

  • Usable as a permanent material for optical application (e.g. lenses, wave guides, optical couplers, diffractive elements, …)
  • Packaging material in the micro electronic
  • Deposition / patterning on substrates with surface topography
  • Imprint material for nano-structuring with high dose accuracy

Nanoimprint Resists

Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.

micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!

Hybrid Polymers

micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.

OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436

Positive Photoresists

Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography

  • Variety of viscosities for 0.1 µm – 60 µm film thickness in one spin-coating step
  • Effective for broadband, g-line, h-line or i-line exposure, laser direct writing at 350…450 nm and e-beam lithography
  • No post exposure bake
  • Easy removal
     
  • For pattern transfer: Etch mask, mould for electroplating, mould for UV moulding
  • Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. MEMS, LEDs, ICs, MOEMS, fiber optics telecommunications devices, flat panel displays

Negative Photoresists

Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography

  • Effective for broadband and i-line, Deep UV, e-beam exposure, or laser direct writing @ 405 nm
  • Lift-off resists with tunable pattern profile, high temperature stability up to 160 °C
  • Variety of viscosities for different film thicknesses in one spin-coating step
     
  • For pattern transfer: Physical vapour deposition (PVD) and single  layer lift-off, etch mask, mould for electroplating
  • For permanent applications: Polymeric waveguides
  • Use in microsystems technology, microelectronics, micro-optics  – manufacture of e.g. LEDs, ICs, MEMS, flat panel displays, fiber optics telecommunications devices