Film Thickness [µm]
Spin Coating @ 3000 rpm |
0.1 |
0.3 |
0.5 |
dyn. Viscosity [mPas]
(@ 25 °C, 1000 s-1) |
1.4 |
2.3 |
3.4 |
Prebake |
90°C |
Sensitivity |
E-beam |
Exposure Dose
E-beam @ 10 keV
E-beam @ 20 keV
E-beam @ 50 keV |
2 - 5 µC/cm2
4 - 6 µC/cm2
20 – 40 µC/cm2 |
Post exposure bake (PEB) |
100 - 120°C |
Developer |
mr-Dev 600 (solvent based) |
Remover |
mr-Rem 700 (NMP & NEP free)
mr-Rem 500 (NMP free)
O2-Plasma |