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Research and Development

“Innovation distinguishes between a leader and a follower.” (Steve Jobs)

Innovation is our source, regardless of whether driven by our self or by our customers. We claim to take the lead with our products and innovative solutions. To reach this goal, a close interaction between research and development is essential. In our research projects we work closely with scientific institutions all over the world. Because only who is well connected will be successful on the top.  In the development the focus is on the customer and his requirements. The tighter the bonding is the more tailored solutions we can generate. Together with the customer, we are able to recognize, evaluate and implement the needs for tomorrow today. The brilliancy can always be seen in the simplicity, especially related to the customer. Our solutions should clearly bring added value to customers. This creates mutual trust, the basis for a long-term cooperation.

A selection of our research projects

Projectnr.: H2020-IND-CE-2016-17/H2020-NMBP-PILOTS-2017, 760915

Funding agency: Europäische Union

Term of Project: 01.01.2018 – 31.12.2021

Projectwebsite: http://www.sunpilot.eu/

Project number: 10162951

Funding agency: State of Berlin

Term of project: 01.01.2017 – 31.05.2020

Project goal

The project is the first to research industrial production of reflection zone plates (RZP) worldwide. The biggest scientific and technical challenge for the project is that the diffractive optical high-tech elements have to be individually designed in a complex process. The innovation in this project is the development of an inexpensive replication process in order to finally make this RZP available to the market for efficient use in optical analysis. The three participating institutions (Neutron Optics Berlin NOB GmbH, Institute for Applied Photonics e.V. IAP, micro resist technology GmbH MRT) are researching new technologies and possible applications for the production of RZP. In addition, adapted measuring technology processes must be researched and developed in order to control the quality in the RZP production and to characterize properties such as the surface roughness, the reflectivity and the structural fidelity of the RZP.

Project benefits

The REFLEX project aims at the development of all processes in order to achieve an integrated value chain in the commercial production of reflection zone plates for the market. To date, these diffractive optical elements, which are characterized by high flexibility, high light output and high time resolution, have only been produced by research institutes. These new components, which allow both energy dispersion and focusing, are primarily intended to supply the market for optical measuring devices for analysis (spectrometers, monochromators).

outlook

With the development of a practice-relevant, efficient replication process, micro resist technology GmbH shows the high technical level of replication technology in-house. It also opens up another new market for the company to use its innovative, optical materials, hybrid polymers.

“This project is co-financed by the European Regional Development Fund (ERDF).”

Funding agency: BMBF

Projects:

  1. Systematische Untersuchungen zur Härtung und Optimierung von Harzen mittels UV-LED-Modulen sowie zur Anwendbarkeit der Harze in unterschiedlichen Produktionsfeldern; TP5: Entwicklung von Photopolymeren und Photoresisten für die Härtung mittels UV-LED-Modulen – AUVL-Basis

Projectnr.: 03ZZ0111E

Term of Project: 01.07.2015 – 31.12.2016

  1. Optimierung und Erweiterung des digitalen UV-Druckes mit LEDs; TP6: Entwicklung von Photopolymeren und Photoresisten für die Härtung mittels UV-LEDModulen– AUVL-OUD-LED

Projectnr.: 03ZZ0125F

Term of Project: 01.11.2016 – 31.10.2019

  1. Innovative UV-LED-aushärtbare Polymermaterialien zur Beschichtung von Glasfasern für Medizin und Materialbearbeitung; TP3: Entwicklung von thermostabilen UV-Coatings für Hochleistungsglasfasern für die Medizintechnik – AUVL-Inno-UV-Faser

Projectnr.: 03ZZ0124C

Term of Project: 01.09.2016 – 31.12.2019

Projectwebsite: www.advanced-uv.de/fe-projekte/

Projectnr.: 03WKCT1D

Funding agency:Funding agency:BMBF

Term of Project: 01.09.2016 – 31.08.2019

Projectwebsite: http://www.polyphotonics-berlin.de/projekte/

imprinting– R2R Biofluidics

Projectnr: H2020-NMP-PILOTS-2014, 646260

Funding agency: Europäische Union

Term of Project: 01.02.2015 – 31.07.2019

Projectwebsite: https://www.r2r-biofluidics.eu/

Lithographic Services & Application Engineering

Based on our product portfolio and extensive hands-on experience, we offers lithographic micro and nanopatterning services.
Tech-blog

Optical 3D patterning by greyscale lithography and UV moulding

An excellent method for the manufacturing of optical 3D structures is grayscale patterning of positive resist ma-P 1200G and subsequent pattern transfer by UV moulding using OrmoStamp® and OrmoComp®.
Tech-blog

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Resist Alliance

micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.

DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)

We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.

Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)

We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.

DJ MicroLaminates, Inc.

We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.

Contact Person

Franziska Kopp

DuPont Electronics & Imaging Products

E-Mail: f.kopp@microresist.de

Phone: +49 30 64 16 70 100

Dr. Anja Voigt

Kayaku Advanced Materials, DJ Mikrolaminates

E-Mail: a.voigt@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

Kayaku Advanced Materials, DJ Mikrolaminates

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Dry Films

Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.

  • Available in different film thicknesses
  • UV-crosslinking as negative photoresist
  • Feasibility of high aspect ratios
  • Vertical sidewalls
  • Multi lamination possible – up to 6 layer  complex multi-layer designs
  • High chemical resilience

 

  • Application as permanent material for optical application (e.g. lenses, wave guides …), in micro fluidics

Contact Person

Carsten Schröder

E-Mail: c.schroeder@microresist.de

Phone: +49 30 64 16 70 100

Functional materials for inkjet-printing

Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process

  • Available in different viscosities (adjustable)
  • Suitable in commercial inkjet printing devices
  • Focused on high reliability of droplet generation
  • UV-curable formulations

 

  • Usable as a permanent material for optical application (e.g. lenses, wave guides, optical couplers, diffractive elements, …)
  • Packaging material in the micro electronic
  • Deposition / patterning on substrates with surface topography
  • Imprint material for nano-structuring with high dose accuracy

Contact Person

Dr. Anja Voigt

E-Mail: a.voigt@microresist.de

Phone: +49 30 64 16 70 100

Dr. Jan Klein

E-Mail: j.klein@microresist.de

Phone: +49 30 64 16 70 100

Hybrid Polymers

micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.

OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436

Contact Person

Dr. Jan Klein

E-Mail: j.klein@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Positive Photoresists

Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography

  • Variety of viscosities for 0.1 µm – 60 µm film thickness in one spin-coating step
  • Effective for broadband, g-line, h-line or i-line exposure, laser direct writing at 350…450 nm and e-beam lithography
  • No post exposure bake
  • Easy removal
     
  • For pattern transfer: Etch mask, mould for electroplating, mould for UV moulding
  • Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. MEMS, LEDs, ICs, MOEMS, fiber optics telecommunications devices, flat panel displays

Contact Person

Dr. Christine Schuster

E-Mail: c.schuster@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Negative Photoresists

Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography

  • Effective for broadband and i-line, Deep UV, e-beam exposure, or laser direct writing @ 405 nm
  • Lift-off resists with tunable pattern profile, high temperature stability up to 160 °C
  • Variety of viscosities for different film thicknesses in one spin-coating step
     
  • For pattern transfer: Physical vapour deposition (PVD) and single  layer lift-off, etch mask, mould for electroplating
  • For permanent applications: Polymeric waveguides
  • Use in microsystems technology, microelectronics, micro-optics  – manufacture of e.g. LEDs, ICs, MEMS, flat panel displays, fiber optics telecommunications devices

Contact Person

Dr. Anja Voigt

E-Mail: a.voigt@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100

Nanoimprint Resists

Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.

micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!

Contact Person

Dr. Manuel Thesen

E-Mail: m.thesen@microresist.de

Phone: +49 30 64 16 70 100

Anja Hinz

E-Mail: a.hinz@microresist.de

Phone: +49 30 64 16 70 100