Fabrication of phase-gradient meta-surfaces consisting of high AR ma-N 2400 patterns
Electron beam lithography using highly sensitive negative tone ma-N 2400 resist in combination with critical point drying enables the direct fabrication of phase-gradient meta-surfaces. This cost-effective alternative material platform and fabrication method effectively reduces the required fabrication to a single lithography step and removes any subsequent need for material deposition, lift-off, or etching.
Application
Cost-effective fabrication of resist polymer based phase-gradient meta-surfaces consisting of high aspect ratio ma-N 2400 patterns.
For this application ma-N 2400 resist offers a) the required high refractive index, b) low absorption in the visible wavelength range, c) sufficient thermal stability and d) stability to light exposure.
Links to related product pages
ma-N 2400
D. Andrén, J. Martínez-Llinàs, Ph. Tassin, M. Käll, R. Verre „Large-Scale Metasurfaces Made by an Exposed Resist“, ACS Photonics 2020, 7, 4, 885-892, https://doi.org/10.1021/acsphotonics.9b01809