We would like to proudly inform you that we will be at the SPIE-AL in San Jose California again this year. You are welcome to meet our experts in the technical exhibition at booth #538.
Furthermore, we are delighted to contribute to the scientific conference with the following oral and post presentations:
- Challenges of photomask-based greyscale lithography with a highly sensitive positive photoresist designed for > 100 µm deep greyscale patterns
A. Voigt, A. Schleunitz, C. Schuster, M. Heinrich, A. Zanzal, P. Reynolds, S. DeMoor, S. Schermer, G. Grützner
- Novel multi-layer nanoimprint lithography material system enabling nano-pattering of functional optical layers
A. Voigt, A. Schleunitz, M. Lohse, M. Messerschmidt, N. Heidensohn, G. Grützner
- Assessing hybrid polymers as innovative photolithography material allowing advanced high aspect ratio / high resolution pattern for micro-optics and patterned passivation layers
A. Voigt, A. Schleunitz, M. Russew, A. Benker, J. Zimmermann, T. Oberbiermann, S. Grützner, M. Koch, J. Wolf, G. Grützner
We look forward to seeing you at SPIE-AL in San Jose from February 25th – 29th, 2024.