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Join the mrt webinar series and meet the experts
Join the mrt webinar series and meet the experts
information

Since 2021 micro resist technology (MRT) has been offering a monthly free online seminar series "mrt webinar - meet the experts" to present innovative photopolymers and related materials developed by MRT and its partners. Due to the encouraging positive feedback from the community ever since, our webinars will continue indefinitely in order to accompany you and your work on a monthly basis. For this, we are in the constant process of organizing future topics and experts contributions.

During the webinar, we review innovations in commercial material solutions which meet both, scientific work where emerging nanofabrication is employed as well as advanced production at industrial level. Furthermore, we occasionally team up with technology partners and academic companions to highlight joined forces for advanced process developments.

Each webinar consists of an expert’s presentation followed by Q&A with our specialists. The invitation is addressed primarily to our customers and partners, but also to the general audience from industry and science.

 

Next Session:

Update on our materials and industry collaborations for nanoimprint lithography (NIL)

Many exciting things have happened due to our ongoing activities regarding nanoimprint lithography (NIL) since the last mrt webinar on NIL materials. Therefore, in the February edition, our expert Dr. Mirko Lohse will review the news within the versatile portfolio provided by our nanoimprint group and update you on the latest achievements through our industry collaborations and novel customer applications.

Please register here: https://register.gotowebinar.com/register/4306335575316623960

Date: 15 February 2023, 13:30 - 14:30 CET
Expert: Dr. Mirko Lohse

 


Upcoming Session:

How to use hybrid polymers - a guideline towards optimal processes

In 2023, we celebrate the important anniversary of product launches for OrmoStamp® (15 years) and InkOrmo (10 years). And we take this as a happy occasion to review important and frequently asked questions about our products from the “Ormo” series we have been asked by a growing number of users over the time. It is our continuous effort to share with the community our evolving know-how for optimal processes when working with hybrid polymers. Therefore, in this webinar edition, our expert Dr. Maria Russew will walk you through the processing guidelines of our hybrid polymers and answer selected user questions in order to enable optimal processes, e.g. for the manufacture of micro-optics.

Please register here: https://register.gotowebinar.com/register/4336978964450563679

Date: 15 March 2023, 13:30 - 14:30 CET
Expert: Dr. Maria Russew

Pushing deep greyscale lithography beyond 100 µm pattern depth with a novel photoresist

In this webinar we will showcase a novel photoresist prototype specifically dedicated to enable greyscale lithography of very deep patterns up to 120 µm, with the prospect of even deeper patterns. Issues limiting the pattern depth caused by the photoresist chemistry were addressed with a well-considered choice of photoresist ingredients, but also with adjustments of the corresponding lithography process. With these results, we push the capabilities of greyscale lithography when it is applied to manufacture complex 2.5D and freeform microstructures in photoresists which serve as master for the pattern transfer into materials for permanent applications, often used in micro-optics.

Please register here: https://register.gotowebinar.com/register/5063755050985451866

Date: 19 April 2023, 13:30 - 14:30 CEST
Expert: Dr. Christine Schuster

An Overview of DJ MicroLaminates’ dry film products and their applications
Date: to be confirmed
Expert: Dr. Malkaye Kpante (DJML)

 


Previous Session:

A concept study on printing processes for individual micro-optical components
In our first webinar in 2023, we start the new year with a focus on our application technology and development skills within micro resist technology. Our expert Johannes Wolf will demonstrate, among other things, the hybrid polymers as versatile materials for micro and nano fabrication. Specifically, he will summarize a concept study that was conducted as an in-house development, examining fabrication routes for prototyping individual micro-optical components using inkjet printing. In doing so, he took advantage of the ability of hybrid polymers to be inkjet compatible on the one hand and to remain a material with exceptional replication fidelity on the other. This allowed him to generate a hybrid and biconvex microlens component, but he wants to inspire the community beyond this exemplary application.
Date: 18 January 2023
Expert: Johannes Wolf

Overview on Mix-and-Match Process Innovation
Our upcoming webinar will highlight a novel mix-and-match approach that connects the high resolution of electron beam lithography (EBL) and the fast exposure of optical i-line stepper lithography. The Head of the Nanolithography group at Fraunhofer ENAS, Dr. Danny Reuter, will give the expert’s presentation. He will show how a photoresist layer of ma-N 1402 was successfully employed to overcome limiting factors in the ongoing miniaturization of microelectronics and nano-electro-mechanical systems (NEMS) by advanced micro- and nanofabrication processes.
Date: 14 December 2022
Expert: Dr. Danny Reuter (FhG ENAS)

Micro- and nanotopographies for Bio application
In this webinar we will host an external expert that has been a customer and research partner to MRT for many years. Currently located in Australia, Dr. Victor Cadarso will show how cells can perceive and react to different micro-topographies. Furthermore, he will demonstrate how we can harness these patterns for example to define the fate of stem cells or to accelerate recovery times when implants with specific micro-topographies are employed that have been previously generated in suitable photoresists and photopolymers by means of micro and nanolithography.
Date: 16 November 2022
Expert: Victor Cardaso (Monash University)

Customized imaging optics based on UV-replicated polymer aspherical lenses
We are back after the summer break! And we will start our webinar series with a presentation by our partner modern camera designs GmbH, which is taking a new approach to lens production using UV-curable hybrid polymers. This technology enables both the economic production of prototypes and the series production of complex imaging systems. The webinar will thus present the advantages of this new technology and its process chain, discuss the materials used and show camera systems realized with the optical components so far.
Date: 12 October 2022
Expert: Frank Wippermann (mcd – modern camera designs GmbH)

Review on MRT’s Ancillary Products
In this contribution, we report on MRT’s a hidden competence in ancillary products which are coming together with our photoresists, polymers and NIL materials.  We often only advertise dedicated process chemicals in connection with photoresists and polymers. But they are equally developed and optimized to give excellent patterning properties. We will review our ancillary products with tailored composition and properties designed for MRT’s products for state-of-the-art patterning techniques. Furthermore, we will discuss general applicability (e.g. to our distribution products) to meet the requirements of lithographical performance for industrial large-scale productions.
Date: 8 June, 2022
Expert: Dr. Anja Voigt

An Overview of DuPont’s i (g)-line, Solvents, Developer and ancillary product offering
This time we will host our webinar in cooperation with our US-based partner company DuPont. This webinar will focus on DuPont’s legacy photoresists that are broadband, g-line and i-line capable. Several i/g resist platforms will be discussed that support different customer requirements such as thickness (above10 µm in a single coat), high resolution and throughput needs, excellent wet/dry etch adhesion, thermal properties and plating compatibilities. Moreover, developers, removers and ancillary products will be discussed to demonstrate that DuPont offers total material solutions across various resist technologies.
Date: 18 May 2022
Expert: Dr. Vipul Jain (DuPont), Florian Trept (DuPont)

Nanoimprinted polymer devices for micro and nanofluidics and single molecule analysis
In the next webinar session we will be supported by a special expert guest and company friend, i.e. Dr. Irene Fernandez-Cuesta, currently active at the Universität Hamburg (Germany). As Head of Group “Nano-Opto-Fluidics” Irene will report on her international research work at various renowned academic institutes in Europe and USA, which has always been related to MRT’s materials. This way, we will learn more about unique concepts in nanoimprinted polymer devices manufacture for micro and nanofluidics and single molecule analysis.
Date: 13 April 2022
Expert: Dr. Irene Fernandez-Cuesta

Update on MRT’s Photoresists for Mask Aligner, Stepper, E-beam and Laser Lithography and their applications
In the upcoming webinar we will give a basic lecture and update on our photoresist materials and their different applications in standard, high resolution lithography as well as thick film technology. We present MRT’s portfolio and highlight our photoresists with tailored composition and properties designed for the fabrication of 2D, 2.5D and complex 3D microstructures. News about adapting lithographical performance and reliability as well as the state-of-the-art patterning techniques for industrial large-scale productions of components and devices will be given.
Date: 16 March 2022
Expert: Dr. Anja Voigt

A starting point of nanofabrication using NIL: compact tool and tailored material kit
In this webinar we will spotlight the collaboration with our partner company NIL Technology ApS that has the goal to provide a starting point of nanofabrication when nanoimprint lithography (NIL) is employed – for example to manufacture nanophotonic elements such as meta lenses. A desktop NIL tool for easy replication of micro- and nanoscale structures together with an tailored starter kit of NIL materials facilitates non-standard processes and new experiments as well as mature and advanced development for the replication of micro- and nanostructures from masters to substrates, both thermal replication and UV replication.
Date: 23 February 2022
Expert: Dr. Kristian Smistrup, Dr. Manuel Thesen

Functional Materials for the Next Generation of Microfluidics
The use of microfluidic devices is an ever growing market and already before the corona crisis point-of-care (PoC)-systems have been used extensively, for instance for the use in blood sugar testing, or the screening of pathogens. The multitude of applications for microfluidic systems, from drug screening to cell assays, to polymer synthesis show the diversity of the platform and the different requirements that are demanded for the materials to fulfill when used. While traditionally these systems are fabricated using standard thermoplastic materials via injection molding, alternative nano and micropatterning techniques offer the possibility to tailor function of the materials and devices with new features. In the webinar, we will give a brief introduction in the different fabrication methods and materials and show application examples using both thermal and UV-NIL materials as well as our proprietary Si containing Hybrid Polymers for UV molding.
Date: January 2022
Expert: Dr. Mirko Lohse

2D or not 2D: do not resist lithography
For our last webinar for 2021 in December we were able to win a special guest speaker and a company friend from Paul Scherrer Institut (PSI, Switzerland). He will take us on a journey through the exciting world of micro- and nanolithography. In doing so, he will converge a large number of processes and technologies that enable innovative applications thanks to tailor-made materials.
Date: December 2021
Expert: Dr. Helmut Schift, PSI Switzerland

Additive Manufacturing (Part 2): 3D Direct Laser Writing based on two-photon polymerization (TPP)
The applicability of photoresist and photopolymers is not limited to standard optical lithography processes only. The availability of tailored UV-curable polymers is also crucial to enable novel additive manufacturing methods when UV-curing step is employed during the patterning process. The emerging technology of additive manufacturing has great potential for rapid prototyping and for the fabrication of true 3D architectures at micrometer scale.

In two consecutive webinars (Part 1 & 2), we report on our contribution to additive manufacturing. In Part 1 (October) we reviewed the outcome of two recent R&D projects on material and process innovations in additive manufacturing of 3D printed polymeric micro-optical and microfluidic components. Now in Part 2 (November) we will focus on material and equipment innovations for 3D Direct Laser Writing based on two-photon polymerization (TPP) together with our partner company Multiphoton Optics GmbH.
Date: November 2021
Expert: Dr. Jonas Wiedenmann, Dr. Maria Russew

Additive Manufacturing (Part 1): Material and Process Innovations
The applicability of photoresist and photopolymers is not limited to standard optical lithography processes only. The availability of tailored UV-curable polymers is also crucial to enable novel additive manufacturing methods when UV-curing step is employed during the patterning process. The emerging technology of additive manufacturing has great potential for rapid prototyping and for the fabrication of true 3D architectures at micrometer scale.
In two consecutive webinars (Part 1 & 2), we will report on our contribution to additive manufacturing. Part 1 (October) will review the outcome of two recent R&D projects on material and process innovations in additive manufacturing of 3D printed polymeric micro-optical and microfluidic components. Part 2 (November) will focus on material and equipment innovations for 3D Direct Laser Writing based on two-photon polymerization (TPP).
Date: October 2021
Expert: Dr. Martin Herder, Johannes Wolf

Innovative Chemical Solutions offered by Kayaku Advanced Materials, Inc.
We will expand our expert base and host the first webinar in cooperation with our US-based partner company Kayaku Advanced Materials Inc. – formerly known as MicroChem Corp. (MCC). A broad range of resist and ancillary products will be introduced which meet almost any applications need, including products such as PMGI and LOR bi-layer, lift-off resists, SU-8 and KMPR® epoxy resists for various sacrificial and permanent imaging applications and PMMA resists for e-beam processing.
Date: September, 2021
Expert: Aurelie Mayeux (Kayaku Advanced Materials)

Application engineering and lithography services @ micro resist technology
During the summer webinar we focused on our in-house research and development capabilities for technology driven projects. It was shown how multiple innovative materials and converging technologies such as nano imprinting, UV molding and UV lithography enable to fabricate complex micro-optical pattern and components. Additionally, we highlighted how our state-of-the-art lithography services empower researchers all over the world in microfluidics.
Date: August, 2021
Expert: Johannes Wolf

Versatile product portfolio of materials for Nanoimprint Lithography (NIL)
We will review MRT's versatile product portfolio for Nanoimprint Lithography (NIL) and enlighten the broad technological background of different NIL material developments. Furthermore, we will accentuate products with their most recent application highlights. Besides pattern transfer processes we will also comment on devices where the imprint materials are used as nanostructured thin films and for metal patterning on nanoscale.
Date: July, 2021
Expert: Dr. Manuel Thesen

Positive resists for standard UV-, greyscale- laser interference- and e-beam lithography
This webinar gives an overview of the positive resists offered by MRT, and their different applications in high resolution lithography as well as thick film technology. In particular, we will highlight our positive photoresists designed for greyscale lithography in the fabrication of complex 3D microstructures. Additionally, further examples of standard UV lithography and even laser interference lithography with these greyscale photoresists will be shown.
Date: June, 2021
Expert: Dr. Christine Schuster

Hybrid Polymers: UV-curable optical polymers for permanent micro-optical and photonic components
In our second webinar, we will highlight our innovative hybrid polymers as advanced high performance optical materials. Due to their tailored composition and unique set of material properties our hybrid polymers meet the requirements of both the optical performance and reliability as well as the state-of-the-art patterning techniques for industrial large-scale productions of micro-optical and photonic components.
Date: May, 2021
Expert: Dr. Jan Jasper Klein

Negative Resists for Mask Aligner, Stepper, E-beam and Laser Lithography
In this first webinar we gave an overview about negative resists MRT is offering and some interesting applications showing/ demonstrating the generation of real 3D patterns at micro and nanoscale. Mix-and-Match approaches were presented in conclusion where processes are smartly combined with each other allowing completely novel additive manufacturing schemes.
Date: April, 2021
Expert: Dr. Anja Voigt

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Element 32
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Resist Alliance

micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.

DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)

We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.

Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)

We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.

DJ MicroLaminates, Inc.

We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.

Dry Films

Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.

  • Available in different film thicknesses
  • UV-crosslinking as negative photoresist
  • Feasibility of high aspect ratios
  • Vertical sidewalls
  • Multi lamination possible – up to 6 layer  complex multi-layer designs
  • High chemical resilience

 

  • Application as permanent material for optical application (e.g. lenses, wave guides …), in micro fluidics

Functional materials for inkjet-printing

Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process

  • Available in different viscosities (adjustable)
  • Suitable in commercial inkjet printing devices
  • Focused on high reliability of droplet generation
  • UV-curable formulations

 

  • Usable as a permanent material for optical application (e.g. lenses, wave guides, optical couplers, diffractive elements, …)
  • Packaging material in the micro electronic
  • Deposition / patterning on substrates with surface topography
  • Imprint material for nano-structuring with high dose accuracy

Hybrid Polymers

micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.

OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436

Positive Photoresists

Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography

  • Variety of viscosities for 0.1 µm – 60 µm film thickness in one spin-coating step
  • Effective for broadband, g-line, h-line or i-line exposure, laser direct writing at 350…450 nm and e-beam lithography
  • No post exposure bake
  • Easy removal
     
  • For pattern transfer: Etch mask, mould for electroplating, mould for UV moulding
  • Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. MEMS, LEDs, ICs, MOEMS, fiber optics telecommunications devices, flat panel displays

Negative Photoresists

Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography

  • Effective for broadband and i-line, Deep UV, e-beam exposure, or laser direct writing @ 405 nm
  • Lift-off resists with tunable pattern profile, high temperature stability up to 160 °C
  • Variety of viscosities for different film thicknesses in one spin-coating step
     
  • For pattern transfer: Physical vapour deposition (PVD) and single  layer lift-off, etch mask, mould for electroplating
  • For permanent applications: Polymeric waveguides
  • Use in microsystems technology, microelectronics, micro-optics  – manufacture of e.g. LEDs, ICs, MEMS, flat panel displays, fiber optics telecommunications devices

Nanoimprint Resists

Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.

micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!