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Join the new mrt webinar series and meet the experts
Join the new mrt webinar series and meet the experts

Since April 2021 micro resist technology (MRT) offers a free online seminar series „mrt webinar – meet the experts“ on a monthly base.

As a commercial supplier for innovative photoresists and photopolymers, MRT aims at providing industrial material solutions tailored for diverse micro and nano fabrication techniques, comprising both materials and technology support. The new webinar series introduces photopolymers and related materials developed at MRT and its partners. We will review innovations in commercial material solutions which meet both, scientific work where emerging nanofabrication is employed as well as advanced production at industrial level.

Due to the special situation of the pandemic, we seek to employ new ways to get in conversation to each other as we have done in the past with you in face-to-face situations. Therefore, we create a virtual space for our networking with you. The invitation is addressed primarily to our customers and partners, but also to the general audience from industry, science and society. Each webinar will consist of an expert’s presentation followed by Q&A with our specialists.

Next Session:

Application engineering and lithography services @ micro resist technology
During the summer webinar we will focus on our in-house research and development capabilities for technology driven projects. It will be shown how multiple innovative materials and converging technologies such as nano imprinting, UV molding and UV lithography enable to fabricate complex micro-optical pattern and components. Additionally, we will highlight how our state-of-the-art lithography services empower researchers all over the world in microfluidics.

Date: 18 August, 2021; 13:30 - 14:30 pm (CEST)
Expert: Johannes Wolf

Please register here: https://register.gotowebinar.com/register/3160651043241356816


Upcoming Session:

Innovative Chemical Solutions offered by Kayaku Advanced Materials, Inc.
We will expand our expert base and host the first webinar in cooperation with our US-based partner company Kayaku Advanced Materials Inc. – formerly known as MicroChem Corp. (MCC). A broad range of resist and ancillary products will be introduced which meet almost any applications need, including products such as PMGI and LOR bi-layer, lift-off resists, SU-8 and KMPR® epoxy resists for various sacrificial and permanent imaging applications and PMMA resists for e-beam processing.

Date: September, 2021
Expert: Aurelie Mayeux (Kayaku Advanced Materials)


Previous Session:

Negative Resists for Mask Aligner, Stepper, E-beam and Laser Lithography
In this first webinar we gave an overview about negative resists MRT is offering and some interesting applications showing/ demonstrating the generation of real 3D patterns at micro and nanoscale. Mix-and-Match approaches were presented in conclusion where processes are smartly combined with each other allowing completely novel additive manufacturing schemes.
Date: April, 2021
Expert: Dr. Anja Voigt

Hybrid Polymers: UV-curable optical polymers for permanent micro-optical and photonic components
In our second webinar, we will highlight our innovative hybrid polymers as advanced high performance optical materials. Due to their tailored composition and unique set of material properties our hybrid polymers meet the requirements of both the optical performance and reliability as well as the state-of-the-art patterning techniques for industrial large-scale productions of micro-optical and photonic components.
Date: May, 2021
Expert: Dr. Jan Jasper Klein

Positive resists for standard UV-, greyscale- laser interference- and e-beam lithography
This webinar gives an overview of the positive resists offered by MRT, and their different applications in high resolution lithography as well as thick film technology. In particular, we will highlight our positive photoresists designed for greyscale lithography in the fabrication of complex 3D microstructures. Additionally, further examples of standard UV lithography and even laser interference lithography with these greyscale photoresists will be shown.
Date: June, 2021
Expert: Dr. Christine Schuster

Versatile product portfolio of materials for Nanoimprint Lithography (NIL)
We will review MRT's versatile product portfolio for Nanoimprint Lithography (NIL) and enlighten the broad technological background of different NIL material developments. Furthermore, we will accentuate products with their most recent application highlights. Besides pattern transfer processes we will also comment on devices where the imprint materials are used as nanostructured thin films and for metal patterning on nanoscale.
Date: July, 2021
Expert: Dr. Manuel Thesen

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Element 32

Resist Alliance

micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.

DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)

We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.

Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)

We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.

DJ MicroLaminates, Inc.

We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.

Dry Films

Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.

  • Available in different film thicknesses
  • UV-crosslinking as negative photoresist
  • Feasibility of high aspect ratios
  • Vertical sidewalls
  • Multi lamination possible – up to 6 layer  complex multi-layer designs
  • High chemical resilience


  • Application as permanent material for optical application (e.g. lenses, wave guides …), in micro fluidics

Functional materials for inkjet-printing

Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process

  • Available in different viscosities (adjustable)
  • Suitable in commercial inkjet printing devices
  • Focused on high reliability of droplet generation
  • UV-curable formulations


  • Usable as a permanent material for optical application (e.g. lenses, wave guides, optical couplers, diffractive elements, …)
  • Packaging material in the micro electronic
  • Deposition / patterning on substrates with surface topography
  • Imprint material for nano-structuring with high dose accuracy

Nanoimprint Resists

Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.

micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!

Hybrid Polymers

micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.

OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436

Positive Photoresists

Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography

  • Variety of viscosities for 0.1 µm – 60 µm film thickness in one spin-coating step
  • Effective for broadband, g-line, h-line or i-line exposure, laser direct writing at 350…450 nm and e-beam lithography
  • No post exposure bake
  • Easy removal
  • For pattern transfer: Etch mask, mould for electroplating, mould for UV moulding
  • Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. MEMS, LEDs, ICs, MOEMS, fiber optics telecommunications devices, flat panel displays

Negative Photoresists

Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography

  • Effective for broadband and i-line, Deep UV, e-beam exposure, or laser direct writing @ 405 nm
  • Lift-off resists with tunable pattern profile, high temperature stability up to 160 °C
  • Variety of viscosities for different film thicknesses in one spin-coating step
  • For pattern transfer: Physical vapour deposition (PVD) and single  layer lift-off, etch mask, mould for electroplating
  • For permanent applications: Polymeric waveguides
  • Use in microsystems technology, microelectronics, micro-optics  – manufacture of e.g. LEDs, ICs, MEMS, flat panel displays, fiber optics telecommunications devices