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Join the mrt webinar series and meet the experts
Join the mrt webinar series and meet the experts
Information
23.08.2022

Since 2021 micro resist technology (MRT) has been offering a monthly free online seminar series "mrt webinar - meet the experts" to present innovative photopolymers and related materials developed by MRT and its partners.

We review innovations in commercial material solutions which meet both, scientific work where emerging nanofabrication is employed as well as advanced production at industrial level. Furthermore, we occasionally team up with technology partners and academic companions to highlight joined forces for advanced process developments.

Each webinar consists of an expert’s presentation followed by Q&A with our specialists. The invitation is addressed primarily to our customers and partners, but also to the general audience from industry and science.


Next Session:

Customized imaging optics based on UV-replicated polymer aspherical lenses

We are back after the summer break! And we will start our webinar series with a presentation by our partner modern camera designs GmbH, which is taking a new approach to lens production using UV-curable hybrid polymers. This technology enables both the economic production of prototypes and the series production of complex imaging systems. The webinar will thus present the advantages of this new technology and its process chain, discuss the materials used and show camera systems realized with the optical components so far.

Date: 12 October 2022, 13:30 CEST
Expert: Frank Wippermann (mcd – modern camera designs GmbH)

Please register here: https://register.gotowebinar.com/register/8629768125015579151

 


Upcoming Session:

Micro- and nanotopographies for Bio application
Date: 16 November 2022; 1:30 PM - 2:30 PM CET
Expert: Victor Cardaso (Monash University)

Overview on Mix-and-Match Process Innovation
Date: December 2022; 1:30 PM - 2:30 PM CET
Expert: Dr. Danny Reuter (FhG ENAS)

An Overview of DJ MicroLaminates’ dry film products and their applications
Date:
to be confirmed
Expert:
Dr. Malkaye Kpante (DJML)

 


Previous Session:

Review on MRT’s Ancillary Products
In this contribution, we report on MRT’s a hidden competence in ancillary products which are coming together with our photoresists, polymers and NIL materials.  We often only advertise dedicated process chemicals in connection with photoresists and polymers. But they are equally developed and optimized to give excellent patterning properties. We will review our ancillary products with tailored composition and properties designed for MRT’s products for state-of-the-art patterning techniques. Furthermore, we will discuss general applicability (e.g. to our distribution products) to meet the requirements of lithographical performance for industrial large-scale productions.

Date: 8 June, 2022; 13:30 – 14:30 pm (CEST)
Expert: Dr. Anja Voigt

An Overview of DuPont’s i (g)-line, Solvents, Developer and ancillary product offering
This time we will host our webinar in cooperation with our US-based partner company DuPont. This webinar will focus on DuPont’s legacy photoresists that are broadband, g-line and i-line capable. Several i/g resist platforms will be discussed that support different customer requirements such as thickness (above10 µm in a single coat), high resolution and throughput needs, excellent wet/dry etch adhesion, thermal properties and plating compatibilities. Moreover, developers, removers and ancillary products will be discussed to demonstrate that DuPont offers total material solutions across various resist technologies.
Date: 18 May 2022
Expert: Dr. Vipul Jain (DuPont), Florian Trept (DuPont)

Nanoimprinted polymer devices for micro and nanofluidics and single molecule analysis
In the next webinar session we will be supported by a special expert guest and company friend, i.e. Dr. Irene Fernandez-Cuesta, currently active at the Universität Hamburg (Germany). As Head of Group “Nano-Opto-Fluidics” Irene will report on her international research work at various renowned academic institutes in Europe and USA, which has always been related to MRT’s materials. This way, we will learn more about unique concepts in nanoimprinted polymer devices manufacture for micro and nanofluidics and single molecule analysis.
Date: 13 April 2022
Expert: Dr. Irene Fernandez-Cuesta

Update on MRT’s Photoresists for Mask Aligner, Stepper, E-beam and Laser Lithography and their applications
In the upcoming webinar we will give a basic lecture and update on our photoresist materials and their different applications in standard, high resolution lithography as well as thick film technology. We present MRT’s portfolio and highlight our photoresists with tailored composition and properties designed for the fabrication of 2D, 2.5D and complex 3D microstructures. News about adapting lithographical performance and reliability as well as the state-of-the-art patterning techniques for industrial large-scale productions of components and devices will be given.
Date: 16 March 2022
Expert: Dr. Anja Voigt

A starting point of nanofabrication using NIL: compact tool and tailored material kit
In this webinar we will spotlight the collaboration with our partner company NIL Technology ApS that has the goal to provide a starting point of nanofabrication when nanoimprint lithography (NIL) is employed – for example to manufacture nanophotonic elements such as meta lenses. A desktop NIL tool for easy replication of micro- and nanoscale structures together with an tailored starter kit of NIL materials facilitates non-standard processes and new experiments as well as mature and advanced development for the replication of micro- and nanostructures from masters to substrates, both thermal replication and UV replication.
Date: 23 February 2022
Expert: Dr. Kristian Smistrup, Dr. Manuel Thesen

Functional Materials for the Next Generation of Microfluidics
The use of microfluidic devices is an ever growing market and already before the corona crisis point-of-care (PoC)-systems have been used extensively, for instance for the use in blood sugar testing, or the screening of pathogens. The multitude of applications for microfluidic systems, from drug screening to cell assays, to polymer synthesis show the diversity of the platform and the different requirements that are demanded for the materials to fulfill when used. While traditionally these systems are fabricated using standard thermoplastic materials via injection molding, alternative nano and micropatterning techniques offer the possibility to tailor function of the materials and devices with new features. In the webinar, we will give a brief introduction in the different fabrication methods and materials and show application examples using both thermal and UV-NIL materials as well as our proprietary Si containing Hybrid Polymers for UV molding.
Date: January 2022
Expert: Dr. Mirko Lohse

2D or not 2D: do not resist lithography
For our last webinar for 2021 in December we were able to win a special guest speaker and a company friend from Paul Scherrer Institut (PSI, Switzerland). He will take us on a journey through the exciting world of micro- and nanolithography. In doing so, he will converge a large number of processes and technologies that enable innovative applications thanks to tailor-made materials.
Date: December 2021
Expert: Dr. Helmut Schift, PSI Switzerland

Additive Manufacturing (Part 2): 3D Direct Laser Writing based on two-photon polymerization (TPP)
The applicability of photoresist and photopolymers is not limited to standard optical lithography processes only. The availability of tailored UV-curable polymers is also crucial to enable novel additive manufacturing methods when UV-curing step is employed during the patterning process. The emerging technology of additive manufacturing has great potential for rapid prototyping and for the fabrication of true 3D architectures at micrometer scale.

In two consecutive webinars (Part 1 & 2), we report on our contribution to additive manufacturing. In Part 1 (October) we reviewed the outcome of two recent R&D projects on material and process innovations in additive manufacturing of 3D printed polymeric micro-optical and microfluidic components. Now in Part 2 (November) we will focus on material and equipment innovations for 3D Direct Laser Writing based on two-photon polymerization (TPP) together with our partner company Multiphoton Optics GmbH.
Date: November 2021
Expert: Dr. Jonas Wiedenmann, Dr. Maria Russew

Additive Manufacturing (Part 1): Material and Process Innovations
The applicability of photoresist and photopolymers is not limited to standard optical lithography processes only. The availability of tailored UV-curable polymers is also crucial to enable novel additive manufacturing methods when UV-curing step is employed during the patterning process. The emerging technology of additive manufacturing has great potential for rapid prototyping and for the fabrication of true 3D architectures at micrometer scale.
In two consecutive webinars (Part 1 & 2), we will report on our contribution to additive manufacturing. Part 1 (October) will review the outcome of two recent R&D projects on material and process innovations in additive manufacturing of 3D printed polymeric micro-optical and microfluidic components. Part 2 (November) will focus on material and equipment innovations for 3D Direct Laser Writing based on two-photon polymerization (TPP).
Date: October 2021
Expert: Dr. Martin Herder, Johannes Wolf

Innovative Chemical Solutions offered by Kayaku Advanced Materials, Inc.
We will expand our expert base and host the first webinar in cooperation with our US-based partner company Kayaku Advanced Materials Inc. – formerly known as MicroChem Corp. (MCC). A broad range of resist and ancillary products will be introduced which meet almost any applications need, including products such as PMGI and LOR bi-layer, lift-off resists, SU-8 and KMPR® epoxy resists for various sacrificial and permanent imaging applications and PMMA resists for e-beam processing.
Date: September, 2021
Expert: Aurelie Mayeux (Kayaku Advanced Materials)

Application engineering and lithography services @ micro resist technology
During the summer webinar we focused on our in-house research and development capabilities for technology driven projects. It was shown how multiple innovative materials and converging technologies such as nano imprinting, UV molding and UV lithography enable to fabricate complex micro-optical pattern and components. Additionally, we highlighted how our state-of-the-art lithography services empower researchers all over the world in microfluidics.
Date: August, 2021
Expert: Johannes Wolf

Versatile product portfolio of materials for Nanoimprint Lithography (NIL)
We will review MRT's versatile product portfolio for Nanoimprint Lithography (NIL) and enlighten the broad technological background of different NIL material developments. Furthermore, we will accentuate products with their most recent application highlights. Besides pattern transfer processes we will also comment on devices where the imprint materials are used as nanostructured thin films and for metal patterning on nanoscale.
Date: July, 2021
Expert: Dr. Manuel Thesen

Positive resists for standard UV-, greyscale- laser interference- and e-beam lithography
This webinar gives an overview of the positive resists offered by MRT, and their different applications in high resolution lithography as well as thick film technology. In particular, we will highlight our positive photoresists designed for greyscale lithography in the fabrication of complex 3D microstructures. Additionally, further examples of standard UV lithography and even laser interference lithography with these greyscale photoresists will be shown.
Date: June, 2021
Expert: Dr. Christine Schuster

Hybrid Polymers: UV-curable optical polymers for permanent micro-optical and photonic components
In our second webinar, we will highlight our innovative hybrid polymers as advanced high performance optical materials. Due to their tailored composition and unique set of material properties our hybrid polymers meet the requirements of both the optical performance and reliability as well as the state-of-the-art patterning techniques for industrial large-scale productions of micro-optical and photonic components.
Date: May, 2021
Expert: Dr. Jan Jasper Klein

Negative Resists for Mask Aligner, Stepper, E-beam and Laser Lithography
In this first webinar we gave an overview about negative resists MRT is offering and some interesting applications showing/ demonstrating the generation of real 3D patterns at micro and nanoscale. Mix-and-Match approaches were presented in conclusion where processes are smartly combined with each other allowing completely novel additive manufacturing schemes.
Date: April, 2021
Expert: Dr. Anja Voigt

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Resist Alliance

micro resist technology ist in Europa zentrale Anlaufstelle für Spezialchemikalien mit Anwendung in der Mikro- und Nanofabrikation. Das Portfolio der eigengefertigten Produkte wird durch den strategischen Vertrieb assoziierter Produkte ergänzt, die durch unsere internationalen Partner hergestellt werden. Hier agieren wir als High-Service-Distributor und bieten dem europäischen Mittelstand ein breites Spektrum an komplementären Produkten aus einer Hand, die sowohl für etablierte als auch für innovative Produktions- und Fertigungsverfahren eingesetzt werden können.

DuPont Electronic Solutions (ehm. DOW Electronic Materials / Rohm and Haas Europe Trading ApS)
Wir bieten Produkte für Semiconductor Technologies, Advanced Packaging und Trockenfilmresiste unseres Partners DuPont an, mit dem wir seit mehr als 20 Jahren zusammenarbeiten. 

Kayaku Advanced Materials, Inc. (ehm. MicroChem Corp.)
Wir bieten Photoresiste und Spezialchemikalien für MEMS und Mikroelektonik-Anwendungen unseres Partners Kayaku Advanced Materials an, mit dem wir seit mehr als 20 Jahren zusammenarbeiten.

DJ MicroLaminates, Inc.
Wir bieten Trockenfilmresiste für MEMS, Mikrofluidik und Packaging-Anwendungen unseres Partners DJ MicroLaminates an, mit dem wir seit über zwei Jahren kooperieren.

 

Trockenfilmresiste

Trockenfilme sind anwendungsfertige Polymerfilme als Laminat mit einer hohen Schichtdickengenauigkeit und exzellenten Haftungseigenschaften auf verschiedensten Untergründen. Sie sind einfach in der Verarbeitung, foto-strukturierbar und sowohl als zugeschnittene Bögen als auch als Rollenmaterial verfügbar.

  • Verfügbar in verschiedenen Dicken
  • UV-vernetzend – wie negativ Fotoresiste
  • Hohe Aspektraten möglich
  • Senkrechte Seitenwände
  • Mehrfachlaminierung möglich – bis zu 6 Schichten  komplexe Multilayer-Designs
  • Hohe chemische Resistenz
  • Anwendung als Permanentmaterial für optische Anwendungen (Linsen, Wellenleiter …), in der Mikrofluidik

Funktionelle Materialien für Inkjet-Printing

Spezielle Funktionsmaterialien aus den Produktgruppen Hybridpolymere, Photoresiste und Nanoimprint Polymere für die Beschichtung und alternative Strukturierung mittels Inkjet-Printing-Verfahren

  • Verfügbar in verschiedenen Viskositäten (einstellbar)
  • Anwendbar in kommerziellen Inkjet-Printing Geräten
  • Ausgerichtet auf stabile Reproduzierbarkeit in der Tropfengeneration
  • UV-aushärtende Formulierungen
  • Anwendung als Permanentmaterial für optische Anwendungen (Linsen, Wellenleiter, optische Koppler, diffraktive Elemente, …)
  • Als Packagingmaterial in der Mikroelektronik
  • Beschichtung / Strukturierung auf Substraten mit Oberflächentopographie 
  • Imprintmaterial in der Nanostrukturierung mit hoher Dosiergenauigkeit

Hybridpolymere

micro resist technology bietet ein breites Portfolio an UV-härtbaren Hybridpolymer Produkten für mikrooptische Anwendungen. Durch ihre ausgezeichnete optische Transparenz  und hohe thermische Stabilität sind diese besonders geeignet zur Herstellung polymerbasierter optischer Komponenten und Wellenleiter. Die Hauptanwendungsgebiete sind die Herstellung von Mikrolinsen, diffraktiven optischen Elementen (DOE), Gitterstrukturen sowie Singlemode- oder Multimode-Wellenleitern.

OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436

Positive Photoresiste

Positiv-Photoresiste für die UV-Lithographie (Mask Aligner-, Laser-, Grauton-Belichtung) und Elektronenstrahllithographie

  • Verschiedene Viskositäten für 0,1 µm – 60 µm Schichtdicke in einem Schleuderbeschichtungsschritt
  • Geeignet für Breitband-, g-Linien- , h-Linien-oder i-Linien-Belichtung, Laser-Direktschreiben bei 350…450 nm und Elektronenstrahllithographie
  • Kein Post Exposure Bake
  • Leichte Entfernbarkeit
     
  • Für die Strukturübertragung: Ätzmaske, Galvanikform, Form für die UV-Abformung
  • Anwendung in Mikrosystemtechnik, Mikroelektronik, Mikro-Optik – Herstellung von z.B. MEMS, LEDs, IC-Bausteinen, MOEMS, Glasfaserkommunikations-Bausteinen, Flachbildschirmen

Negative Photoresiste

Photoresiste für UV (Mask Aligner, Laser)/ Elektronenstrahl- und Tief-UV-Lithographie

  • Geeignet für Breitband- und i-Linien-Belichtung, Tief-UV- oder Elektronenstrahlbelichtung,  oder Laserdirektschreiben @ 405 nm
  • Lift-off Resiste mit einstellbarem Kantenprofil, hohe Temperaturstabilität bis zu 160 °C
  • ​Verschiedene Viskositäten für unterschiedliche Schichtdicken in einem Schleuderbeschichtungsschritt
     
  • Für die Strukturübertragung: Physical vapour deposition (PVD) und Lift-off als Einschichtsystem, Ätzmaske, Galvanikform 
  • Für die Permanentanwendung: Polymerbasierte Wellenleiter
  • Anwendung in Mikrosystemtechnik, Mikroelektronik, Mikro-Optik – Herstellung von z. B. LEDs, ICs, MEMS, Flachbildschirmen, Glasfaserkommunikations-Bausteinen

Nanoimprint-Resiste

Resiste für die Nanoimprint-Lithographie (NIL)

Die Nanoimprint Lithographie (NIL) ist eine sehr einfache und kostengünstige Technologie zur Herstellung von Strukturen mit Größen weniger Nanometer, die effizient in einem Prozessschritt auch auf großen Flächen realisiert werden kann. Hauptanwendungsfelder der NIL sind photonische Komponenten, unterschiedliche Bauelemente für die nächste Generation der Verbraucherelektronik, sowie Bio- und Life-Science-Sensoren.

Die micro resist technology GmbH bietet seit 1999 maßgeschneiderte Resistformulierungen für die Nanoimprint-Lithographie (NIL) an. Wir legen dabei besonderen Wert auf herausragende Filmbildungs- und Prägeeigenschaften sowie eine exzellente Plasmaätzstabilität und Strukturtreue. Weiterhin bieten wir hochinnovative Materialien, die eng an dem technischen Fortschritt in der Industrie entwickelt wurden. Wir sind in der Lage unsere Materialien an die Kundenwünsche anzupassen, sowohl in den gewünschten Schichtdicken, als auch in deren intrinsischen Materialeigenschaften. Die Nanoimprint-Resiste werden meist als Ätzmaske zur Strukturübertragung in unterschiedliche Substrate wie Si, SiO2, Al oder Saphir, eingesetzt.

Prinzipiell existieren zwei unterschiedliche NIL-Technologien: die thermische NIL (T-NIL), in der thermoplastische Polymere Verwendung finden, und die Photo-NIL bzw. UV-NIL, in der photo-vernetzbare Formulierungen eingesetzt werden. Mit unserer langjährigen Erfahrung sind wir in der Lage, den für Sie passenden Prozess und das am besten geeignetste Material für Ihre Anwendung zu finden. Kontaktieren Sie uns für tiefergehende Informationen.