In March 2019 the Chemnitzer Seminar Elektronenstrahlithographie: Materialien – Prozesse – Anwendungen will be held in Chemnitz, Germany (March 13, 2019):
As part of the technical program, micro resist technology GmbH will contribute with the following presentation “Novel innovative polymers and photoresists for advanced high resolution 3D and nano fabrication”. Don’t miss the opportunity, to get a broad overview of different aspects of electron beam lithography and to meet experts in all sorts of disciplines for e-beam lithography.
Participation is free for registration! We looking forward seeing you there!