Lithographic Services & Application Engineering
Based on our product portfolio and extensive hands-on experience, we offers lithographic micro and nanopatterning services.
micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Our nanoimprint resists are mostly applied as etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.
Basically, two different variants of NIL have been developed so far: thermal NIL (T-NIL), in which a thermoplastic polymer is used, and photo-NIL, in which a liquid photo-curable formulation is applied.
|Thermal Nanoimprint Lithography||Etch mask, permanent applications|
|Combined thermal- and Photo-Nanoimprint Lithography||Etch mask|
|Photo-Nanoimprint Lithography||Etch mask, permanent applications|
|Working Stamp Fabrication||Suitable for all imprint technologies|
|Ancillaries||Thinner, adhesion promoter and underlayer materials|