New Organic Photo-Curable Nanoimprint Resist «mr-NIL210» for High Volume Fabrication Applying Soft PDMS-Based Stamps
M Messerschmidt et al., Journal of Photopolymer Science and Technology, Volume 30, Number 5 (2017) 6 0 5 -6 1 1
Link: https://www.jstage.jst.go.jp/article/photopolymer/30/5/30_605/_article/-char/en
UV-NIL based nanostructuring of aluminum using a novel organic imprint resist demonstrated for 100 nm half-pitch wire grid polarizer
F Schlachter et al., Microelectronic Engineering Volume 155, 2 April 2016, Pages 118-121
https://www.sciencedirect.com/science/article/abs/pii/S0167931716301587
Nanoindentation of crystalline silicon pillars fabricated by soft UV nanoimprint lithography and cryogenic deep reactive ion etching
G Hamdana et al., Sensors and Actuators A: Physical Volume 283, 1 November 2018, Pages 65-78
Link: https://www.sciencedirect.com/science/article/abs/pii/S092442471830102X