As 2022 draws to a close, we proudly highlight a major achievement that our nanoimprint lithography (NIL) group has accomplished this year in collaboration with two key players in the European NIL ecosystem.
We have been gifted by our partners with two beautiful wafers imprinted with our latest NIL material release, the mr-NIL212FC, showing the high compatibility of our product with industry standard processes and tooling.
One of the wafers shows a flawless 8-inch full wafer imprint with an optimized residual layer thickness, which was realized with the SMILE technology developed by SUSS MicroTec SE. The other wafer shows an 8-inch full wafer replica using EV Group's proprietary SmartNIL technology, followed by plasma etching at FhG ENAS.
We gratefully thank our partners and feel very privileged to have worked with our network for so many years, which always results in such mutual successes.
If you want to see the beauties for yourself, just follow our news for upcoming exhibitions in 2023! In the meantime, don’t hesitate to get in touch with our NIL expert Dr. Mirko Lohse (m.lohse@microresist.de).