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mr-I 9000M series
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Unique Features

  • Excellent thermal structure stability (up to 250 °C in a two-step imprinting process) in subsequent processes due to the thermally induced crosslinking reaction during imprinting
  • 100% organic resist → dry etching and stripping possible with pure oxygen plasma

Applications

Fabrication of nanopatterns by pattern transfer for e.g.

  • High brightness LEDs
  • Photonic crystals
  • Patterned media
  • Nano-optical devices, subwavelength optical elements
Thermally curable NIL resist (Thermoset - no Tg after imprinting)
Thermoset

quotation request

This product is currently out of stock and unavailable.

Hybrid Polymers
Now available: Hybrid polymers in cartridges
Now available: Hybrid polymers in cartridges
micro resist technology GmbH is pleased to offer our customers a new container size for hybrid polymers. OrmoComp®, OrmoStamp®, OrmCore, OrmoClad as well as all products of the OrmoClear® series are now available in 55cc cartridges with standard Luer-Lock connector...
dispensingr
hybrid polymers
OrmoComp®, OrmoStamp®, OrmoClear®
cartridge
micro optics
09. September 2022
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Nanoimprint Resists
How to make an imprint in a simple manual setup using mr-NIL210
Soft UV-NIL is an excellent method to replicate nano patterns with a flexible soft working stamp on different kinds of substrates.
UV-NIL resist Replication of nano patterns soft working stamp manual imprinting UV-PDMS mr-NIL210 mr-NIL212FC
24. March 2022
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Nanoimprint, Nanoimprint Resists
mr-NIL212FC – Our latest product for UV nanoimprint lithography
mr-NIL212FC – Our latest product for UV nanoimprint lithography
micro resist technology GmbH is pleased to present a new product in the field of materials for nanoimprint lithography: mr-NIL212FC.
Nanoimprint Resist
Nanoimprint Lithography
UV-NIL
Soft UV-NIL
Dry Etch Mask
04. March 2022
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Hybrid Polymers, Negative Photoresists
3D micro structures via two-photon polymerization (2PP)
3D micro structures via two-photon polymerization (2PP)
The two-photon polymerization is an excellent method for the manufacturing of individually designed (optical) 3D micro structures with OrmoComp® or mr-DWL, which cannot obtained with conventional lithography techniques due to their complexity.
Negative Photoresists
Hybrid Polymers
Two-Photon Polymerization (2PP)
3D microstructures
Microfluidics and micro-bio-fluidics
Lab-on-a-Chip
OrmoComp
mr-DWL series
11. February 2022
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Hybrid Polymers
OrmoPrime20 – A new adhesion promoter for our Hybrid Polymers
OrmoPrime20 – A new adhesion promoter for our Hybrid Polymers
micro resist technology GmbH would like to announce the release of a new product: OrmoPrime20. OrmoPrime20 is an adhesion promoter based on organofunctional silanes.
Adhesion promoter
Hybrid polymers
Ancillaries
Adhesion promoter for Hybrid polymers
OrmoPrime20
24. January 2022
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Nanoimprint Resists
Ready-To-Use Spin-On Thin-Film COC Formulations For Permanent Applications
Ready-To-Use Spin-On Thin-Film COC Formulations For Permanent Applications
The chemical nature of Cyclic Olefin Copolymers (COCs) offers very unique material properties, making them not only attractive for the manufacturing of specialized injection moulded parts but also for several thin film applications.
Nanoimprint Resist
Bio-Applications
Lab-on-Chip
optical Polymer
Thin film-formulation Cycloolefin-Copolymer COC
mr-IT85
21. January 2022
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Element 32
0

Resist Alliance

micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.

DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)

We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.

Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)

We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.

DJ MicroLaminates, Inc.

We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.

Dry Films

Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.

  • Available in different film thicknesses
  • UV-crosslinking as negative photoresist
  • Feasibility of high aspect ratios
  • Vertical sidewalls
  • Multi lamination possible – up to 6 layer  complex multi-layer designs
  • High chemical resilience

 

  • Application as permanent material for optical application (e.g. lenses, wave guides …), in micro fluidics

Functional materials for inkjet-printing

Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process

  • Available in different viscosities (adjustable)
  • Suitable in commercial inkjet printing devices
  • Focused on high reliability of droplet generation
  • UV-curable formulations

 

  • Usable as a permanent material for optical application (e.g. lenses, wave guides, optical couplers, diffractive elements, …)
  • Packaging material in the micro electronic
  • Deposition / patterning on substrates with surface topography
  • Imprint material for nano-structuring with high dose accuracy

Hybrid Polymers

micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.

OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436

Positive Photoresists

Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography

  • Variety of viscosities for 0.1 µm – 60 µm film thickness in one spin-coating step
  • Effective for broadband, g-line, h-line or i-line exposure, laser direct writing at 350…450 nm and e-beam lithography
  • No post exposure bake
  • Easy removal
     
  • For pattern transfer: Etch mask, mould for electroplating, mould for UV moulding
  • Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. MEMS, LEDs, ICs, MOEMS, fiber optics telecommunications devices, flat panel displays

Negative Photoresists

Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography

  • Effective for broadband and i-line, Deep UV, e-beam exposure, or laser direct writing @ 405 nm
  • Lift-off resists with tunable pattern profile, high temperature stability up to 160 °C
  • Variety of viscosities for different film thicknesses in one spin-coating step
     
  • For pattern transfer: Physical vapour deposition (PVD) and single  layer lift-off, etch mask, mould for electroplating
  • For permanent applications: Polymeric waveguides
  • Use in microsystems technology, microelectronics, micro-optics  – manufacture of e.g. LEDs, ICs, MEMS, flat panel displays, fiber optics telecommunications devices

Nanoimprint Resists

Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.

micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!