mr-P 1200LIL is a series of thin positive tone photoresists for high resolution applications. It is excellently suited for laserinterference lithography (LIL).

Unique Features

  • 100…500 nm film thickness
  • Sensitive to 350…450 nm exposure
  • Steep sidewalls due to high contrast enable high quality etched patterns
  • Aqueous alkaline development
  • Etch resistant

Applications

Masking of substrate surfaces during fabrication of steep-edged nano structures for diffractive optics:

  • Laminary gratings
  • VLS gratings
Resist

Film thickness @ 3000 rpm

mr-P 1201LIL

0.1 µm

mr-P 1202LIL

0.2 µm

Our positive photoresists are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)

Developer and Remover: • 1.0 l • 2.5 l • 5.0 l (Ancillaries)

HMDS Primer: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

Thinner: • 0.5 l • 1.0 l (Ancillaries)

Interested in mr-P 1200LIL ? Contact us!

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