ma-P 1275 and ma-P 1275HV are high viscosity positive tone photoresists for film thicknesses of up to 60 μm

Unique Features

  • Broadband, g-, h- and i-line exposure
  • High stability in acid and alkaline plating baths
  • High dry and wet etch resistance
  • Good thermal stability of the resist patterns attainable
  • Aqueous alkaline development
  • Side wall angle up to 87° with mask aligner broadband exposure
  • Suitable for pattern reflow

Applications

  • Mould for electroplating – e.g. for micro coils, micro springs
  • Fabrication of micro optical components – e.g. microlenses by pattern transfer from reflowed resist patterns
  • Etch mask for metal and semiconductor substrates
  • Mask for ion implantation
     
Resist

Film thickness @ 3000 rpm

ma-P 1275

7.5 µm

ma-P 1275HV

11.0 µm

Our positive photoresists are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)

Developer and Remover: • 1.0 l • 2.5 l • 5.0 l (Ancillaries)

HMDS Primer: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

Thinner: • 0.5 l • 1.0 l (Ancillaries)

Interested in ma-P 1275, ma-P 1275HV ? Contact us!

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