Permanent application and conventional pattern transfer processes

Unique Features

  • Sensitive above 400 nm, for direct writing laser @ 405 nm
  • High thermal and chemical stability
  • High wet and dry etch stability 

Applications

  • Fast and contactless prototyping by
  • Permanent: Master/ template manufacture, mould for PDMS
  • Pattern transfer: Etch mask, mould for electroplating
     

Resist

Film tickness

mr-DWL 5

5.0 µm @ 3000 rpm

mr-DWL 40

40 µm @ 2000 rpm

mr-DWL 100 100 µm @ 1500 rpm

Our negative photoresists are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)

Developer and Remover: • 1.0 l • 2.5 l • 5.0 l (Ancillaries)

Thinner: • 0.5 l • 1.0 l (Ancillaries)

Interested in mr-DWL series ? Contact us!

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