T-NIL resist (Tg = 85 °C) based on non-polar cyclo-olefin-copolymers (TOPAS)

Unique Features

  • Film thickness of up to 5 µm possible for the fabrication of microfluidic or lab-on-chip devices
  • 100% organic thermoplast → dry etching and stripping possible with pure oxygen plasma
  • featuring the highest optical transparency in the range of UV/vis and distinctive chemical stability against e.g. different solvents, acids, and bases


Lab-on-chip systems

  • Bio applications
  • Microfluidics
  • Microoptical elements
  • Wave guides
  • Single and multilayer systems
  • Mask for pattern transfer processes
Material characteristics and imprint parameters mr-I T85
Glass transition temperature 85 °C
Imprint temperature 130 – 150 °C
Imprint pressure 5 – 20 bar
Ready-to-use solutions for various film thicknesses (3000 rpm) *

mr-I T85-0.3 300 nm

mr-I T85-1.0 1.0 µm

mr-I T85-5.0 5.0 µm

* Customized film thickness available on request

This NIL resist series is available in the following quantities:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)
  • Larger packing sizes available on request

Interested in mr-I T85 series ? Contact us!

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