T-NIL resist (Tg = 105 °C) for fundametal NIL investigations

Unique Features

  • Good imprint behavior
  • Easy cleaning with conventional solvents

Applications

  • Basic investigations
     

mr-PMMA version

Film thickness *

mr-I PMMA35k-100nm 100 nm
mr-I PMMA35k-300nm 300 nm
mr-I PMMA35k-500nm 500 nm

* Customized film thickness available on request

This NIL resist series is available in the following quantities:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)
  • Larger packing sizes available on request

Interested in mr-I PMMA35k series ? Contact us!

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