mr-UVCur26SF is a pure organic and solvent-free Photo-NIL resist developed for inkjet dispensing. The low viscosity and the fast photo-curing reaction makes mr-UVCur26SF suitable for continuous roll-to-roll NIL processes.

Unique Features

  • Inkjet dispensing at room temperature due to low viscosity (15 mPas), e.g. for step-and-repeat NIL processes
  • No prebake after substrate coating due to solvent-free resist formulation
  • Very fast curing for high throughput R2R-NIL, web speed up to 30 m/min shown
  • Good adhesion to PC and PET substrates
  • Excellent dry etch stability for pattern transfer processes
  • Residue-free removable with oxygen plasma

Applications

  • Etch mask for pattern transfer processes (dry and wet etching)
  • Application of  nanostructures on polymer foils
  • Fabrication of nanostructures for
    • Nano-optical devices, SOEs
    • Organic electronics (OLED, OPV, OTFT)
    • Microelectronics
    • LEDs, photonic crystals

 Process parameters for inkjet dispensing

Process step

Process parameter

Inkjet parameter

Piezo actuated printhead, dispensing possible at room temperature

Prebake

Not necessary (solvent-free)

Imprint temperature

Room temperature

Imprint pressure

> 100 mbar

Radiation dose

> 500 mJ cm-2 (λ =  320 – 420 nm)

Thinner

Not recommended

Primer

mr-APS1 (e.g. for Si)

 Process parameters for roll-to-roll NIL

Process step

Process parameter

Resist application method

Gravure printing, inkjet dispensing, etc.

Prebake

Not necessary (solvent-free)

Web speed

Depending on and limited by tool setup and light source, up to 30 m/min shown so far

Imprint temperature

Room temperature

Imprint pressure

Depending on roller imprinter

Radiation dose

> 500 mJ cm-2 (λ =  320 – 420 nm)

Thinner

Not recommended

Primer

Not necessary (good adhesion to PC, PET, etc.)

mr-UVCur26SF is available in the following quantities:

  • 100 ml
  • 250 ml
  • 500 ml
  • 1000 ml
  • Larger packing sizes available on request

Interested in mr-UVCur26SF ? Contact us!

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