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  1. Products
  2. Positive Photoresists
  3. E-Beam Lithography

E-Beam Lithography

PDF Flyer Positiv

 

mr-PosEBR series - Positive resist series for e-beam lithography

  • Ÿ Variety of viscosities for different film thicknesses in one spin coating step
  • Ÿ For pattern transfer: etch mask
Sample Product Application PDF Details
mr-PosEBR series

Etch mask

 

Products

  • Positive Photoresists
    • UV Lithography
    • Greyscale Lithography
    • E-Beam Lithography
    • Ancillaries
    • FAQ
  • Negative Photoresists
    • UV lithography (broadband and i line exposure)
    • E-Beam/ Deep UV Lithography
    • Laser direct writing @ 405 nm
    • Ink-Jet Printing
    • Ancillaries
    • FAQ
  • Hybrid Polymers
    • UV Imprint/ UV Moulding
    • UV Lithography
    • Ink-jet printing
    • Working Stamp Fabrication
    • Ancillaries
    • FAQ
  • Nanoimprint Resists
    • Thermal Nanoimprint Lithography
    • Combined thermal- and Photo-Nanoimprint Lithography
    • Photo-Nanoimprint Lithography
    • Herstellung Polymerer Arbeitsstempel
    • FAQ
    • Ancillaries

Products of other manufacturer

  • DOW Electronic Materials
  • MicroChem Corp. Products
  • DuPont Dry Film Resists
  • Dry Film Photoresists

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