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Negative Photoresists
UV lithography (broadband and i line exposure)
E-Beam/ Deep UV Lithography
Laser direct writing @ 405 nm
Ink-Jet Printing
Ancillaries
FAQ
Positive Photoresists
UV Lithography
Greyscale Lithography
E-Beam Lithography
Ancillaries
FAQ
Hybrid Polymers
UV Imprint/ UV Moulding
UV Lithography
Ink-jet printing
Working Stamp Fabrication
Ancillaries
FAQ
Nanoimprint Resists
Thermal Nanoimprint Lithography
Combined thermal- and Photo-Nanoimprint Lithography
Photo-Nanoimprint Lithography
Herstellung Polymerer Arbeitsstempel
FAQ
Ancillaries
Products of other manufacturer
DOW Electronic Materials
MicroChem Corp. Products
DuPont Dry Film Resists
Dry Film Photoresists
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Products
Positive Photoresists
E-Beam Lithography
E-Beam Lithography
PDF Flyer Positiv
mr-PosEBR series
- Positive resist series for e-beam lithography
Variety of viscosities for different film thicknesses in one spin coating step
For pattern transfer: etch mask
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mr-PosEBR series
Etch mask
Products
Positive Photoresists
UV Lithography
Greyscale Lithography
E-Beam Lithography
Ancillaries
FAQ
Negative Photoresists
UV lithography (broadband and i line exposure)
E-Beam/ Deep UV Lithography
Laser direct writing @ 405 nm
Ink-Jet Printing
Ancillaries
FAQ
Hybrid Polymers
UV Imprint/ UV Moulding
UV Lithography
Ink-jet printing
Working Stamp Fabrication
Ancillaries
FAQ
Nanoimprint Resists
Thermal Nanoimprint Lithography
Combined thermal- and Photo-Nanoimprint Lithography
Photo-Nanoimprint Lithography
Herstellung Polymerer Arbeitsstempel
FAQ
Ancillaries
Products of other manufacturer
DOW Electronic Materials
MicroChem Corp. Products
DuPont Dry Film Resists
Dry Film Photoresists