The table contains summarised information on recommended process chemicals for positive photoresists.

Detailed information, such as recommendations for different substrates, film thicknesses and applications, can be found in the processing guidelines.

Thinner

Positive Resist Thinner
ma-P 1200

ma-T 1050

ma-P 1275/ ma-P 1275HV

ma-T 1050

ma-P 1200G

ma-T 1050

ma-P 1200LIL

ma-T 1050

Primer

Positive Resist Primer
ma-P 1200

HMDS, SurPass 4000

ma-P 1275/ ma-P 1275HV

HMDS, SurPass 4000

ma-P 1200G

HMDS, SurPass 4000

ma-P 1200LIL

HMDS

Developer

Positive Resist

Aqueous alkaline

Solvent based

ma-P 1200

ma-D 331, ma-D 331/S (NaOH based)
mr-D 526/S (TMAH based)

 

ma-P 1275/ ma-P 1275HV

ma-D 331, ma-D 331/S (NaOH based)
mr-D 526/S (TMAH based)

 
mr-P 1200LIL

mr-D 374/S (silicate/ phosphate based)

 
ma-P 1200G

Greyscale lithography: ma-D 532/S, mr-D 526/S (TMAH based)
Binary lithography: ma-D 331 (NaOH based)

 

mr-PosEBR   mr-Dev 800

Remover: mr-Rem 700 (NMP & NEP free), mr-Rem 400/ 500 (NMP free), mr-Rem 660 (NMP)

Positive Resist

Solvent based

Aqueous, strongly alkaline

ma-P 1200

mr-Rem 700, mr-Rem 660, mr-Rem 500, (mr-Rem 400)

ma-R 404/S

ma-P 1275/ ma-P 1275HV

mr-Rem 700, mr-Rem 660, mr-Rem 500, (mr-Rem 400)

ma-R 404/S

mr-P 1200LIL

mr-Rem 700, mr-Rem 660, mr-Rem 500, (mr-Rem 400)

ma-R 404/S
ma-P 1200G

mr-Rem 700, mr-Rem 660, mr-Rem 500, (mr-Rem 400)

ma-R 404/S

mr-PosEBR Acetone  

  Chrome Etching Solution

Metal

Etchant

Chrome

Chrome Etch 18