Negative Photoresists for UV lithography
- Effective for broadband and i-line exposure
- Variety of viscosities for different film thicknesses in one spin-coating step
ma-N 400 and ma-N 1400
are single layer lift-off resist series with tunable pattern profile and high temperature stability for pattern transfer processes by means of physical vapour deposition (PVD) and lift-off, as well as etch mask.
EpoCore and EpoClad
series are materials with different refractive index for the manufacture of polymeric multimode (MM) and single mode (SM) waveguides as permanent application.