Negative Photoresists for UV lithography

• Effective for broadband and i-line exposure
• Variety of viscosities for different film thicknesses in one spin-coating step

ma-N 400 and ma-N 1400

are single layer lift-off resist series with tunable pattern profile and high temperature stability for pattern transfer processes by means of physical vapour deposition (PVD) and lift-off, as well as etch mask.

EpoCore and EpoClad

series are materials with different refractive index for the manufacture of polymeric multimode (MM) and single mode (SM) waveguides as permanent application.