mr-PosEBR series

Positive resists for e-beam lithography

Unique Features

  • Highly sensitive
  • High resolution capability (< 50 nm)
  • Excellent dry etch resistance
  • Development in organic solvents 

Applications

  • Etch mask   

Resist

Film tickness @ 3000 rpm

mr-PosEBR 0.05

50 nm

mr-PosEBR 0.1

100 nm

mr-PosEBR 0.3

300 nm

Our positive photoresists are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)

Developer and Remover: • 1.0 l • 2.5 l • 5.0 l (Ancillaries)

Thinner: • 0.5 l • 1.0 l (Ancillaries)

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