mr-XNIL26SF

Photo-curable NIL resist featuring high content of fluorinated components

Unique Features

  • high content of fluorinated components for easy stamp release and low defectivity
  • 100% organic, easy strippable with oxygen plasma
  • Can be diluted to 100nm film thickness using PGMEA or ma-T 1045

Applications

  • NIL applications where comparably low release forces are essential (e.g. imprints on top of a multilayer stack)
     

mr-XNIL26 version

Film thickness

mr-XNIL26SF

4.8 µm

Our NIL polymers are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 100 ml as sample on request (extra charge for small quantities)

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