In March 2019 the 2nd European Symposium on Direct Write, Optical, Ion and Electron beam Lithography will be held in IST Austria, (March 13, 2019):

Don’t miss the opportunity, to get a broad overview of different aspects of nanolithography and to meet experts in all sorts of nanolithography disciplines. As part of the technical program, micro resist technology GmbH will contribute with the following presentation “Latest Highlights in Resist and Photopolymer Development for UV direct writing and E-beam lithography”.
Capacities are limited, so please sign up! We looking forward seeing you at IST Austria in Klosterneuburg ( )!