MNE 2018 • 24 - 27 September 2018
We are pleased to announce our participation in the MNE 2018 – the 44th International Conference on Micro- and Nanofabrication and Manufacturing using Lithography and Related Techniques in Copenhagen (Denmark), 24-27 September 2018 (http://www.mne2018.org/).
Our team is looking forward meeting you at our booth in the technical exhibition to inform you about our newest innovation regarding photoresists, special polymers, UV-curable hybrid polymers and ancillary materials for micro- and nanolithography applications and micro-optics manufacture.
Furthermore, our experts will contribute to the scientific program with the following presentation:
“Novel fabrication concept for manufacture of individual polymeric micro-optical components using replication and inkjet-printing techniques“ by Johannes Wolf & Susanne Grützner (Tuesday 25 September 2018, 3:35 PM, Session: 02‐12: NIL/R2R, Location: Auditorium 12).
“Efficient fabrication of photonic and optical patterns by imprinting the tailored photocurable NIL resist «mr-NIL200» with bendable imprint stamps“ by Dr. Martin Messerschmidt (Poster Session).