EpoCore & EpoClad Serien

UV lithography (broadband and i line exposure)

Low optical loss permanent application

Unique Features

  • Standard UV lithography and PCB technology
  • High transmittance @ 850 nm
  • Optical loss ~ 0.2 dB/cm @ 850 nm
  • High heat and pressure resistance
  • Tunable refractive index (core/ cladding)

Applications

  • Optical polymer multimode (MM) and single mode (SM) waveguides:
  •  EpoCore as core and EpoClad as cladding material

EpoCore

Product

Film thickness

EpoCore 2

2.0 µm @ 3000 rpm

EpoCore 5

5.0 µm @ 3000 rpm

EpoCore 10

10 µm @ 3000 rpm

EpoCore 20

20 µm @ 3000 rpm

EpoCore 50

50 µm @ 1500 rpm

EpoClad

Product Film thickness

EpoClad 2

2.0 µm @ 3000 rpm

EpoClad 5

5.0 µm @ 3000rpm

EpoClad 10

10 µm @ 3000rpm

EpoClad 20

20 µm @ 3000rpm

EpoClad 50

50 µm @ 1700 rpm

Our negative photoresists are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)

Developer and Remover: • 1.0 l • 2.5 l • 5.0 l (Ancillaries)

Primer: • 100 ml • 0,25 l • 0,5 l • 1,0 l (Ancillaries)

OrmoClear®FX

UV Imprint/ UV Moulding

OrmoClear®FX offers glass-like material properties after UV curing. It is optimized for micro- and nanooptical components of different pattern sizes and dimensions.

Unique Features

  • Highly transparent for near UV and VIS down to 350 nm
  • High thermal and mechanical stability

Applications

  • Moulded gratings and prisms
  • Micro lenses and micro lens arrays
  • Optical couplers and connectors
  • Microfluidic systems
  • Single elements or wafer scale
     
Parameter

OrmoClear®FX

OrmoComp®

Viscosity

1.5 +/- 0.3 Pa•s

2 ± 0.5 Pa•s

Resolution

Down to 100 nm feature sizes

Thermal stability

Up to 270 °C (short term)

Volume shrinkage

3 – 5 %

5 – 7 %

Refractive index (589 nm, cured)

1.555

1.520

Replication with PDMS molds
(no oxygen sensitivity)

Yes Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solutions

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

ma-N 400 & ma-N 1400 series

UV lithography (broadband and i line exposure)

Single layer lift-off application, conventional pattern transfer processes

Unique Features

  • Tunable pattern profile: vertical to undercut
  • Good thermal stability of the resist pattern
  • High wet and dry etch resistance
  • Aqueous alkaline development
  • Easy to remove

ma-N 400: Thermal stability up to 110°C for metal evaporation

ma-N 1400: Thermal stability up to 160°C for metal evaporation and sputtering

Application

  • Mask for lift-off processes
  • Etch mask for semiconductors and metals
  • Mask for ion implantation

ma-N 400

Resist Film thickness @ 3000 rpm
ma-N 405    0.5 µm
ma-N 415 1.5 µm
ma-N 420 2.0 µm
ma-N 440    4.1 µm
ma-N 490   7.5 µm

 ma-N 1400

Resist    Film thickness @ 3000 rpm
ma-N 1405 0.5 µm
ma-N 1407    0.7 µm
ma-N 1410    1.0 µm
ma-N 1420 2.0 µm
ma-N 1440 4.0 µm

Our negative photoresists are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)

Developer and Remover: • 1.0 l • 2.5 l • 5.0 l (Ancillaries)

Primer: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

Thinner: • 0.5 l • 1.0 l (Ancillaries)

OrmoStamp®

Working Stamp Fabrication

OrmoStamp® offers glass-like properties after UV curing and was designed for the fabrication of transparent polymer working stamps with excellent pattern fidelity

Unique Features

  • Highly transparent for near UV and visible light
  • High thermal and mechanical stability
  • Enhanced anti-adhesive properties for low release forces
  • Processing with standard lithography equipment

Applications

  • Transparent working stamp fabrication
  • Cost efficient alternative to quartz stamps
  • UV-based and thermal imprinting, nanoimprint lithography
     
Parameter

OrmoStamp®

Viscosity

0.4 +/– 0.2 Pa•s

Resolution, pattern replication

Excellent pattern replication

Thermal stability

Up to 270 °C (short term)

Refractive index (589 nm, cured) 1.516
Replication with PDMS molds
(no oxygen sensitivity)
Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solution

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

OrmoStamp®

Working Stamp Fabrication

OrmoStamp® offers glass-like properties after UV curing and was designed for the fabrication of transparent polymer working stamps with excellent pattern fidelity

Unique Features

  • Highly transparent for near UV and visible light
  • High thermal and mechanical stability
  • Enhanced anti-adhesive properties for low release forces
  • Processing with standard lithography equipment

Applications

  • Transparent working stamp fabrication
  • Cost efficient alternative to quartz stamps
  • UV-based and thermal imprinting, nanoimprint lithography
     
Parameter

OrmoStamp®

Viscosity

0.4 +/– 0.2 Pa•s

Resolution, pattern replication

Excellent pattern replication

Thermal stability

Up to 270 °C (short term)

Refractive index (589 nm, cured)

1.516

Replication with PDMS molds
(no oxygen sensitivity)

Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solution

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

OrmoCore and OrmoClad

UV Lithography

OrmoCore and OrmoClad offer glass-like material properties after UV curing and are due to their low optcal loss particulary suitable for optical waveguide fabrication

Unique Features

  • Low optical loss at datacom wavelengths
  • Tunable refractive index (Core/Clad ratios)
  • High thermal and mechanical stability

Applications

  • Single-mode and multi-mode waveguides
  • Beam splitters
  • Thermo-optical switches
  • Microring resonators
     
 

OrmoCore

OrmoClad

Viscosity

2.9 +/- 0.4 Pa•s

2.5 +/- 1 Pa•s

Resolution

Down to 100 nm feature sizes

Down to 100 nm feature sizes

Thermal stability

Up to 270 °C (short term)

Up to 270 °C (short term)

Refractive index
(589 nm, cured)

1.555

1.537

Replication with PDMS molds
(no oxygen sensitivity)

No No

Shelf-life

6 months

6 months

Solvent-free

Yes, ready-to-use solutions

Yes, ready-to-use solutions

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

OrmoClear® Series

UV Imprint/ UV Moulding

The OrmoClear® series offers glass-like material properties after UV curing and due to its very low volume shrinkage during UV exposure it is suitable for components of dimensions > 100 µm

Unique Features

  • Highly transparent for near UV and VIS down to 350 nm
  • High thermal and mechanical stability

Applications

  • Moulded gratings and prisms
  • Micro lenses and micro lens arrays
  • Optical couplers and connectors
  • Microfluidic systems
  • Single elements or wafer scale
     
Parameter OrmoClear® OrmoClear®30 OrmoClear®FX

Viscosity

2.9 ± 0.3 Pa•s

30 ± 3 Pa•s

1.5 ± 0.3 Pa•s

Resolution

Down to 100 nm feature sizes

Volume shrinkage

3 - 5 %

<< 2 %

3 - 5 %

Thermal stability

Up to 270 °C (short term)

Refractive index
(589 nm, cured)

1.555

1.561

1.555

Replication with PDMS molds
(no oxygen sensitivity)

No No Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solutions

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

OrmoComp®

UV Imprint/ UV Moulding

OrmoComp® offers glass-like material properties after  UV curing and is the standard product for a broad range of pattern sizes and component dimensions

Unique Features

  • Highly transparent for near UV and VIS down to 350 nm
  • High thermal and mechanical stability

Applications

  • Moulded gratings and prisms
  • Micro lenses and micro lens arrays
  • Optical couplers and connectors
  • Microfluidic systems
  • Single elements or wafer scale
     
Parameter

OrmoComp®

OrmoClear®FX

Viscosity

2 ± 0.5 Pa•s

1.5 +/- 0.3 Pa•s

Resolution

Down to 100 nm feature sizes

Thermal stability

Up to 270 °C (short term)

Volume shrinkage

5 – 7 %

3 – 5 %

Refractive index (589 nm, cured)

1.520

1.555

Replication with PDMS molds
(no oxygen sensitivity)

Yes Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solutions

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

ma-P 1275, ma-P 1275HV

UV Lithography

ma-P 1275 and ma-P 1275HV are high viscosity positive tone photoresists for film thicknesses of up to 60 μm

Unique Features

  • Broadband, g-, h- and i-line exposure
  • High stability in acid and alkaline plating baths
  • High dry and wet etch resistance
  • Good thermal stability of the resist patterns attainable
  • Aqueous alkaline development
  • Side wall angle up to 87° with mask aligner broadband exposure
  • Suitable for pattern reflow

Applications

  • Mould for electroplating – e.g. for micro coils, micro springs
  • Fabrication of micro optical components – e.g. microlenses by pattern transfer from reflowed resist patterns
  • Etch mask for metal and semiconductor substrates
  • Mask for ion implantation
     
Resist

Film thickness @ 3000 rpm

ma-P 1275

7.5 µm

ma-P 1275HV

11.0 µm

Our positive photoresists are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)

Developer and Remover: • 1.0 l • 2.5 l • 5.0 l (Ancillaries)

HMDS Primer: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

Thinner: • 0.5 l • 1.0 l (Ancillaries)

ma-P 1200

UV Lithography

ma-P 1200 is a positive tone photoresist series designed for the use in microelectronics and microsystems technology. The resists are available in a variety of viscosities for film thicknesses of 0.3 – 40 μm in one spin-coating step

Unique Features

  • Broadband, g-, h- and i-line exposure
  • Very good pattern stability in wet etch processes and acid and alkaline plating baths
  • Highly stable in dry etch processes e.g. CHF3, CF4, SF6
  • Aqueous alkaline development 

Applications

  • Mask for etching e.g.Si, SiO2, other semiconductors, metals
  • Mask for ion implantation
  • Mould for electroplating
     
Resist

Film thickness @ 3000 rpm

ma-P 1205

0.5 µm

ma-P 1210

1.0 µm

ma-P 1215

1.5 µm

ma-P 1225

2.5 µm

ma-P 1240

4.0 µm

ma-P 1275

7.5 µm

Our positive photoresists are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)

Developer and Remover: • 1.0 l • 2.5 l • 5.0 l (Ancillaries)

HMDS Primer: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

Thinner: • 0.5 l • 1.0 l (Ancillaries)