OrmoClear®FX

UV Imprint/ UV Moulding

OrmoClear®FX offers glass-like material properties after UV curing. It is optimized for micro- and nanooptical components of different pattern sizes and dimensions.

Unique Features

  • Highly transparent for near UV and VIS down to 350 nm
  • High thermal and mechanical stability

Applications

  • Moulded gratings and prisms
  • Micro lenses and micro lens arrays
  • Optical couplers and connectors
  • Microfluidic systems
  • Single elements or wafer scale
     
Parameter

OrmoClear®FX

OrmoComp®

Viscosity

1.5 +/- 0.3 Pa•s

2 ± 0.5 Pa•s

Resolution

Down to 100 nm feature sizes

Thermal stability

Up to 270 °C (short term)

Volume shrinkage

3 – 5 %

5 – 7 %

Refractive index (589 nm, cured)

1.555

1.520

Replication with PDMS molds
(no oxygen sensitivity)

Yes Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solutions

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

mr-UVCur26SF

Photo-Nanoimprint Lithography

mr-UVCur26SF is a pure organic and solvent-free Photo-NIL resist developed for inkjet dispensing. The low viscosity and the fast photo-curing reaction makes mr-UVCur26SF suitable for continuous roll-to-roll NIL processes.

Unique Features

  • Inkjet dispensing at room temperature due to low viscosity (15 mPas), e.g. for step-and-repeat NIL processes
  • No prebake after substrate coating due to solvent-free resist formulation
  • Very fast curing for high throughput R2R-NIL, web speed up to 30 m/min shown
  • Good adhesion to PC and PET substrates
  • Excellent dry etch stability for pattern transfer processes
  • Residue-free removable with oxygen plasma

Applications

  • Etch mask for pattern transfer processes (dry and wet etching)
  • Application of  nanostructures on polymer foils
  • Fabrication of nanostructures for
    • Nano-optical devices, SOEs
    • Organic electronics (OLED, OPV, OTFT)
    • Microelectronics
    • LEDs, photonic crystals

 Process parameters for inkjet dispensing

Process step

Process parameter

Inkjet parameter

Piezo actuated printhead, dispensing possible at room temperature

Prebake

Not necessary (solvent-free)

Imprint temperature

Room temperature

Imprint pressure

> 100 mbar

Radiation dose

> 500 mJ cm-2 (λ =  320 – 420 nm)

Thinner

Not recommended

Primer

mr-APS1 (e.g. for Si)

 Process parameters for roll-to-roll NIL

Process step

Process parameter

Resist application method

Gravure printing, inkjet dispensing, etc.

Prebake

Not necessary (solvent-free)

Web speed

Depending on and limited by tool setup and light source, up to 30 m/min shown so far

Imprint temperature

Room temperature

Imprint pressure

Depending on roller imprinter

Radiation dose

> 500 mJ cm-2 (λ =  320 – 420 nm)

Thinner

Not recommended

Primer

Not necessary (good adhesion to PC, PET, etc.)

mr-UVCur26SF is available in the following quantities:

  • 100 ml
  • 250 ml
  • 500 ml
  • 1000 ml
  • Larger packing sizes available on request

UV-curable liquid silicone rubber / UV-PDMS

Herstellung Polymerer Arbeitsstempel

Distribution for european markets now

micro resist technology GmbH is providing a new selection of UV-curable liquid silicone rubber / UV-PDMS (OEM:Shin-Etsu) for European markets. The UV-PDMS can be used in a wide range of applications, but in particular for the manufacture of soft-molds in replication technologies such as nanoimprint lithography.

Main advantages by using the new Shin-Etsu UV-PDMS over generic PDMS:

  • Spin-coating for enhanced mold fabrication
  • Faster curing time (e.g. 10 min after UV exposure)
  • High resolution capabilities down 100 nm and smaller
  • 0.02% shrinkage for superb pattern fidelity
     

There are two different types of UV-PDMS available. The following table provides the general material characteristics of the two different types of UV-PDMS:

General material characteristics of the new UV-PDMS (OEM:Shin-Etsu)

 

KER-4690

(X-34-4184)

KER-4691

(X-34-4208)

Appearance
(Color Tone)

Colorless

Milky-white

Appearance
(Transparency)

Transparent

Semi-
transparent

Viscosity
[Pa・s]

2.7

110

Hardness:
Durometer
type-A

55

42

Elongation
at Break [%]

110

400

Tensile Strength
[MPa]

7.7

7.0

Tear Propagation
Strength (crescent)
[kN/m]

3.0

17.1

Linear
Contraction [%]

<0.1

<0.1

Curing Rate*
[Min]

20

45

Curing Condition
[mJ/cm2]

2000

2000

* TA Instruments ARES-G2, 25℃, 1Hz

Each system consists of two components. After thoroughly mixing the two-component material system (A/B) in equal volume, the liquid mixture compounds can be processed for up to 24 hours by casting, spin-coating or other deposition methods. Due to the photo-sensitivity, the cross-linking (or curing) is initiated by UV-exposure. In contrast to generic PDMS, this allows almost full curing already at room temperature and significantly increases the curing speed (by factor of 100 and more). Furthermore, without the need of an additional thermal curing one can achieve a minimized shrinkage of 0.02%.

 

For detailed information on material properties and process specifications, please get in contact with the product manager NIL polymers Dr. Manuel Thesen (m.thesen@microresist.de). In case of inquiry request or purchase order, please contact our sales assistant Mrs. Anja Hinz (a.hinz@microresist.de).

 

The Shin-Etsu UV-PDMS are available in the following package sizes:

50 g / 50 g (UV-PDMS KER-4690-A/B)

500 g / 500 g (UV-PDMS KER-4690-A/B and KER-4691-A/B)

OrmoStamp®

Herstellung Polymerer Arbeitsstempel

OrmoStamp® offers glass-like properties after UV curing and was designed for the fabrication of transparent polymer working stamps with excellent pattern fidelity

Unique Features

  • Highly transparent for near UV and visible light
  • High thermal and mechanical stability
  • Enhanced anti-adhesive properties for low release forces
  • Processing with standard lithography equipment

Applications

  • Transparent working stamp fabrication
  • Cost efficient alternative to quartz stamps
  • UV-based and thermal imprinting, nanoimprint lithography
     
Parameter

OrmoStamp®

Viscosity

0.4 +/– 0.2 Pa•s

Resolution, pattern replication

Excellent pattern replication

Thermal stability

Up to 270 °C (short term)

Refractive index (589 nm, cured) 1.516
Replication with PDMS molds
(no oxygen sensitivity)
Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solution

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

OrmoStamp®

Working Stamp Fabrication

OrmoStamp® offers glass-like properties after UV curing and was designed for the fabrication of transparent polymer working stamps with excellent pattern fidelity

Unique Features

  • Highly transparent for near UV and visible light
  • High thermal and mechanical stability
  • Enhanced anti-adhesive properties for low release forces
  • Processing with standard lithography equipment

Applications

  • Transparent working stamp fabrication
  • Cost efficient alternative to quartz stamps
  • UV-based and thermal imprinting, nanoimprint lithography
     
Parameter

OrmoStamp®

Viscosity

0.4 +/– 0.2 Pa•s

Resolution, pattern replication

Excellent pattern replication

Thermal stability

Up to 270 °C (short term)

Refractive index (589 nm, cured)

1.516

Replication with PDMS molds
(no oxygen sensitivity)

Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solution

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

OrmoClear® Series

UV Imprint/ UV Moulding

The OrmoClear® series offers glass-like material properties after UV curing and due to its very low volume shrinkage during UV exposure it is suitable for components of dimensions > 100 µm

Unique Features

  • Highly transparent for near UV and VIS down to 350 nm
  • High thermal and mechanical stability

Applications

  • Moulded gratings and prisms
  • Micro lenses and micro lens arrays
  • Optical couplers and connectors
  • Microfluidic systems
  • Single elements or wafer scale
     
Parameter OrmoClear® OrmoClear®30 OrmoClear®FX

Viscosity

2.9 ± 0.3 Pa•s

30 ± 3 Pa•s

1.5 ± 0.3 Pa•s

Resolution

Down to 100 nm feature sizes

Volume shrinkage

3 - 5 %

<< 2 %

3 - 5 %

Thermal stability

Up to 270 °C (short term)

Refractive index
(589 nm, cured)

1.555

1.561

1.555

Replication with PDMS molds
(no oxygen sensitivity)

No No Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solutions

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

OrmoComp®

UV Imprint/ UV Moulding

OrmoComp® offers glass-like material properties after  UV curing and is the standard product for a broad range of pattern sizes and component dimensions

Unique Features

  • Highly transparent for near UV and VIS down to 350 nm
  • High thermal and mechanical stability

Applications

  • Moulded gratings and prisms
  • Micro lenses and micro lens arrays
  • Optical couplers and connectors
  • Microfluidic systems
  • Single elements or wafer scale
     
Parameter

OrmoComp®

OrmoClear®FX

Viscosity

2 ± 0.5 Pa•s

1.5 +/- 0.3 Pa•s

Resolution

Down to 100 nm feature sizes

Thermal stability

Up to 270 °C (short term)

Volume shrinkage

5 – 7 %

3 – 5 %

Refractive index (589 nm, cured)

1.520

1.555

Replication with PDMS molds
(no oxygen sensitivity)

Yes Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solutions

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

mr-XNIL26 series

Photo-Nanoimprint Lithography

Photo-curable NIL resist featuring high content of fluorinated components for easy stamp release rendering low defectivity

Unique Features

  • high content of fluorinated components for easy stamp release and low defectivity
  • 100% organic, easy strippable with oxygen plasma

Applications

  • NIL applications where comparably low release forces are essential (e.g. imprints on top of a multilayer stack)
     

mr-XNIL26 version

Film thickness

mr-XNIL26-100nm

100 nm

mr-XNIL26-200nm

200 nm

mr-XNIL26-300nm

300 nm

mr-XNIL26SF

4.8 µm

Our NIL polymers are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)

mr-I 9000M series

Thermal Nanoimprint Lithography

Thermally curable NIL resist (Thermoset - no Tg after imprinting)

Unique Features

  • Excellent thermal structure stability (up to 250 °C in a two-step imprinting process) in subsequent processes due to the thermally induced crosslinking reaction during imprinting
  • 100% organic resist → dry etching and stripping possible with pure oxygen plasma

Applications

Fabrication of nanopatterns by pattern transfer for e.g.

  • High brightness LEDs
  • Photonic crystals
  • Patterned media
  • Nano-optical devices, subwavelength optical elements
     

mr-I 9000M version *

Film thickness *

mr-I 9010M

100 nm

mr-I 9020M 200 nm
mr-I 9030M 300 nm
mr-I 9050M 500 nm
mr-I 9100M 1.0 µm

* Customized film thickness available on request

This NIL resist series is available in the following quantities:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)
     
  • Available thinner: ma-T 1045
  • Resist stripping: oxygen plasma
  • Larger packing sizes available on request

mr-I T85 series

Thermal Nanoimprint Lithography

T-NIL resist (Tg = 85 °C) based on non-polar cyclo-olefin-copolymers (TOPAS)

Unique Features

  • Film thickness of up to 5 µm possible for the fabrication of microfluidic or lab-on-chip devices
  • 100% organic thermoplast → dry etching and stripping possible with pure oxygen plasma
  • featuring the highest optical transparency in the range of UV/vis and distinctive chemical stability against e.g. different solvents, acids, and bases

Applications

Lab-on-chip systems

  • Bio applications
  • Microfluidics
  • Microoptical elements
  • Wave guides
  • Single and multilayer systems
  • Mask for pattern transfer processes
     
Material characteristics and imprint parameters mr-I T85
Glass transition temperature 85 °C
Imprint temperature 130 – 150 °C
Imprint pressure 5 – 20 bar
Ready-to-use solutions for various film thicknesses (3000 rpm) *

mr-I T85-0.3 300 nm

mr-I T85-1.0 1.0 µm

mr-I T85-5.0 5.0 µm

* Customized film thickness available on request

This NIL resist series is available in the following quantities:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)
  • Larger packing sizes available on request