UV-curable liquid silicone rubber / UV-PDMS

Working Stamp Fabrication

Distribution for european markets now

micro resist technology GmbH is providing a new selection of UV-curable liquid silicone rubber / UV-PDMS (OEM:Shin-Etsu) for European markets. The UV-PDMS can be used in a wide range of applications, but in particular for the manufacture of soft-molds in replication technologies such as nanoimprint lithography.

Main advantages by using the new Shin-Etsu UV-PDMS over generic PDMS:

  • Spin-coating for enhanced mold fabrication
  • Faster curing time (e.g. 10 min after UV exposure)
  • High resolution capabilities down 100 nm and smaller
  • 0.02% shrinkage for superb pattern fidelity
     

There are two different types of UV-PDMS available. The following table provides the general material characteristics of the two different types of UV-PDMS:

General material characteristics of the new UV-PDMS (OEM:Shin-Etsu)

 

KER-4690

(X-34-4184)

KER-4691

(X-34-4208)

Appearance
(Color Tone)

Colorless

Milky-white

Appearance
(Transparency)

Transparent

Semi-
transparent

Viscosity
[Pa・s]

2.7

110

Hardness:
Durometer
type-A

55

42

Elongation
at Break [%]

110

400

Tensile Strength
[MPa]

7.7

7.0

Tear Propagation
Strength (crescent)
[kN/m]

3.0

17.1

Linear
Contraction [%]

<0.1

<0.1

Curing Rate*
[Min]

20

45

Curing Condition
[mJ/cm2]

2000

2000

* TA Instruments ARES-G2, 25℃, 1Hz

Each system consists of two components. After thoroughly mixing the two-component material system (A/B) in equal volume, the liquid mixture compounds can be processed for up to 24 hours by casting, spin-coating or other deposition methods. Due to the photo-sensitivity, the cross-linking (or curing) is initiated by UV-exposure. In contrast to generic PDMS, this allows almost full curing already at room temperature and significantly increases the curing speed (by factor of 100 and more). Furthermore, without the need of an additional thermal curing one can achieve a minimized shrinkage of 0.02%.

 

For detailed information on material properties and process specifications, please get in contact with the product manager NIL polymers Dr. Manuel Thesen (m.thesen@microresist.de). In case of inquiry request or purchase order, please contact our sales assistant Mrs. Anja Hinz (a.hinz@microresist.de).

 

The Shin-Etsu UV-PDMS are available in the following package sizes:

50 g / 50 g (UV-PDMS KER-4690-A/B)

500 g / 500 g (UV-PDMS KER-4690-A/B and KER-4691-A/B)

OrmoStamp®

Working Stamp Fabrication

OrmoStamp® offers glass-like properties after UV curing and was designed for the fabrication of transparent polymer working stamps with excellent pattern fidelity

Unique Features

  • Highly transparent for near UV and visible light
  • High thermal and mechanical stability
  • Enhanced anti-adhesive properties for low release forces
  • Processing with standard lithography equipment

Applications

  • Transparent working stamp fabrication
  • Cost efficient alternative to quartz stamps
  • UV-based and thermal imprinting, nanoimprint lithography
     
Parameter

OrmoStamp®

Viscosity

0.4 +/– 0.2 Pa•s

Resolution, pattern replication

Excellent pattern replication

Thermal stability

Up to 270 °C (short term)

Refractive index (589 nm, cured) 1.516
Replication with PDMS molds
(no oxygen sensitivity)
Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solution

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

OrmoStamp®

Working Stamp Fabrication

OrmoStamp® offers glass-like properties after UV curing and was designed for the fabrication of transparent polymer working stamps with excellent pattern fidelity

Unique Features

  • Highly transparent for near UV and visible light
  • High thermal and mechanical stability
  • Enhanced anti-adhesive properties for low release forces
  • Processing with standard lithography equipment

Applications

  • Transparent working stamp fabrication
  • Cost efficient alternative to quartz stamps
  • UV-based and thermal imprinting, nanoimprint lithography
     
Parameter

OrmoStamp®

Viscosity

0.4 +/– 0.2 Pa•s

Resolution, pattern replication

Excellent pattern replication

Thermal stability

Up to 270 °C (short term)

Refractive index (589 nm, cured)

1.516

Replication with PDMS molds
(no oxygen sensitivity)

Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solution

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

InkOrmo

Ink-jet printing

InkOrmo is a UV-curable ink-solution offering glass-like material properties after curing  and it is ideally for the fabrication of micro-lenses via ink-jet printing

Unique Features

  • Excellent thermal, mechanical and chemical stability of cured patterns
  • High transparency to near UV and visible light
  • Compatible to standard ink-jet heads

Applications

  • Single micro-lenses and micro-lens arrays
  • Waveguides and microfluidic devices
  • Spacers and protecting layers
  • Large-area substrate processing
     
Parameter

InkOrmo

Viscosity

7, 12 or 18 mPa•s

Thermal stability

Up to 270 °C (short term)

Shelf-life

6 months

Solvent-free

No

Our hybrid polymers are available in the following filling sizes:

  •     100 ml
  •     250 ml
  •     500 ml
  •     1000 ml

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

OrmoComp®

UV Imprint/ UV Moulding

OrmoComp® offers glass-like material properties after  UV curing and is the standard product for a broad range of pattern sizes and component dimensions

Unique Features

  • Highly transparent for near UV and VIS down to 350 nm
  • High thermal and mechanical stability

Applications

  • Moulded gratings and prisms
  • Micro lenses and micro lens arrays
  • Optical couplers and connectors
  • Microfluidic systems
  • Single elements or wafer scale
     
Parameter

OrmoComp®

OrmoClear®FX

Viscosity

2 ± 0.5 Pa•s

1.5 +/- 0.3 Pa•s

Resolution

Down to 100 nm feature sizes

Thermal stability

Up to 270 °C (short term)

Volume shrinkage

5 – 7 %

3 – 5 %

Refractive index (589 nm, cured)

1.520

1.555

Replication with PDMS molds
(no oxygen sensitivity)

Yes Yes

Shelf-life

6 months

Solvent-free

Yes, ready-to-use solutions

Our hybrid polymers are available in the following filling sizes:

  •     100 g
  •     250 g
  •     500 g
  •     1000 g

OrmoThin; OrmoPrime®08: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

OrmoDev: • 1.0 l • 2.5 l • 5.0 l (Ancillaries) 

ma-P 1275, ma-P 1275HV

UV Lithography

ma-P 1275 and ma-P 1275HV are high viscosity positive tone photoresists for film thicknesses of up to 60 μm

Unique Features

  • Broadband, g-, h- and i-line exposure
  • High stability in acid and alkaline plating baths
  • High dry and wet etch resistance
  • Good thermal stability of the resist patterns attainable
  • Aqueous alkaline development
  • Side wall angle up to 87° with mask aligner broadband exposure
  • Suitable for pattern reflow

Applications

  • Mould for electroplating – e.g. for micro coils, micro springs
  • Fabrication of micro optical components – e.g. microlenses by pattern transfer from reflowed resist patterns
  • Etch mask for metal and semiconductor substrates
  • Mask for ion implantation
     
Resist

Film thickness @ 3000 rpm

ma-P 1275

7.5 µm

ma-P 1275HV

11.0 µm

Our positive photoresists are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)

Developer and Remover: • 1.0 l • 2.5 l • 5.0 l (Ancillaries)

HMDS Primer: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

Thinner: • 0.5 l • 1.0 l (Ancillaries)

ma-P 1200

UV Lithography

ma-P 1200 is a positive tone photoresist series designed for the use in microelectronics and microsystems technology. The resists are available in a variety of viscosities for film thicknesses of 0.3 – 40 μm in one spin-coating step

Unique Features

  • Broadband, g-, h- and i-line exposure
  • Very good pattern stability in wet etch processes and acid and alkaline plating baths
  • Highly stable in dry etch processes e.g. CHF3, CF4, SF6
  • Aqueous alkaline development 

Applications

  • Mask for etching e.g.Si, SiO2, other semiconductors, metals
  • Mask for ion implantation
  • Mould for electroplating
     
Resist

Film thickness @ 3000 rpm

ma-P 1205

0.5 µm

ma-P 1210

1.0 µm

ma-P 1215

1.5 µm

ma-P 1225

2.5 µm

ma-P 1240

4.0 µm

ma-P 1275

7.5 µm

Our positive photoresists are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)

Developer and Remover: • 1.0 l • 2.5 l • 5.0 l (Ancillaries)

HMDS Primer: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

Thinner: • 0.5 l • 1.0 l (Ancillaries)

ma-P 1200G

Greyscale Lithography

ma-P 1200G is a positive tone photoresist series specifically designed for the requirements of greyscale lithography. Standard binary lithography is also possible.

Unique Features

  • Reduced contrast
  • Film thickness up to 60 µm and higher
  • 50-60 µm depth range of the patterns possible in greyscale lithography
  • Spectral sensitivity 350…450 nm
  • High intensity laser exposure possible without outgassing
  • Aqueous alkaline development, for greyscale lithography with TMAH based developers, for standard binary lithography also with metal ion bearing developers
  • Suitable for electroplating
  • Suitable for dry etch processes e.g. with CHF3, CF4, SF6
  • Suitable for pattern reflow after standard binary lithography  

Applications

Use of manufactured 3D patterns in micro-optics, MEMS and MOEMS, displays

Pattern transfer by

  • UV moulding
  • Etching
  • Electroplating
Resist

Film thickness @ 3000 rpm

ma-P 1215G

1.5 µm

ma-P 1225G

2.5 µm

ma-P 1275G

9.5 µm

Our positive photoresists are available in the following filling sizes:

  • 0.25 l
  • 0.5 l
  • 1.0 l
  • 2.5 l
  • 100 ml as sample on request (extra charge for small quantities)

Developer and Remover: • 1.0 l • 2.5 l • 5.0 l (Ancillaries)

HMDS Primer: • 100 ml • 0.25 l • 0.5 l • 1.0 l (Ancillaries)

Thinner: • 0.5 l • 1.0 l (Ancillaries)