product list
Element 2
+49 30 641 670 100
Element 1
info@microresist.de
_MG_2147B
abzug321
083A4185
083A1786
083A1995
083A2518
083A4191
083A4476

micro resist technology GmbH (MRT) – leader in the development, production and distribution of innovative photoresists, polymers and photopolymers

About us

micro resist technology GmbH (MRT) was founded in 1993 and has developed from an initially owner-managed company into a leading global supplier of materials for micro- and nanostructuring. Since March 1st, 2025, MRT has been part of the TOK Group – TOKYO OKHA KOGYO CO., LTD (TOK). Two established photoresist manufacturers are thus entering into a strategic partnership that will further strengthen their customer-centredbusiness approaches and the global competitiveness of both companies. The Berlin-based company combines development, production, logistics and a cleanroom laboratory under one roof and currently employs more than 50 people.

The company’s core expertise lies in the development, production and sale of photoresists, polymers and photopolymers as well as complementary process chemicals, which are used in a variety of lithographic production processes for micro- and nanostructuring. The materials are used in future technology fields such as microsystems technology, microelectronics, opto- and nanophotonics, nanotechnology and in areas such as life sciences, sensor technology, augmented and virtual reality and microfluidics. MRT is aimed at both industrial customers and academic research institutions and offers comprehensive technical advice and application support in addition to its products.

One of the particular company strengths of micro resist technology GmbH lies in its strict focus on research. The company develops innovative materials and processes in close cooperation with international universities and research partners, including as part of European projects. The company’s cleanroom capacity and close co-operation with partners enable it to test products in a practical manner and to develop application-oriented solutions together with customers.

With over three decades of experience, a clear emphasis on technological excellence and a strong culture of innovation, micro resist technology GmbH is a reliable partner for companies and research institutions worldwide. By joining forces with TOK, MRT opens up new potential in the European semiconductor strategy and continues its development as a future-orientated high-tech company. MRT further intensifies its global reach of business opportunities through the worldwide presence of TOK group and making European material innovations available to an expanded list of customers and complementary fields of application and industry level while TOK further expands its businesses to the semiconductor industry in Europe.

Resist-Alliance

As Resist Alliance we see ourselves as a single entry point for specialty chemicals used in micro and nano manufacturing. Thus, we complement the portfolio of our in-house products with the strategic sales of associated products from other international manufacturers. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes

History

Since the company was founded in 1993 in Berlin, we have been producing specialized materials for the global high-tech markets, in which processes such as UV, laser, X-ray and electron beam lithography, nanoimprint lithography and associated structuring technologies are used. In a continuous innovation process, we expand our product portfolio and also develop customer-specific solutions of the highest quality. We have been certified according to DIN EN ISO 9001 (quality management system) since 1997 and since 2011 according to DIN EN ISO 14001 (environmental management system).

Contact us:

Fields marked with an * are required.
Produkte
0
Gesamt
€0,00
➥
Element 32
0

Resist Alliance

micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.

DuPont Electronic Solutions (formerly DOW Electronic Materials / Rohm and Haas Europe Trading ApS)

We offer products for semiconductor technologies, advanced packaging and dry film resists from our partner DuPont, with whom we have been working for more than 20 years.

Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)

We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.

DJ MicroLaminates, Inc.

We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.

Dry Films

Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.

  • Available in different film thicknesses
  • UV-crosslinking as negative photoresist
  • Feasibility of high aspect ratios
  • Vertical sidewalls
  • Multi lamination possible – up to 6 layer  complex multi-layer designs
  • High chemical resilience

 

  • Application as permanent material for optical application (e.g. lenses, wave guides …), in micro fluidics
Element 23weqwf

Functional materials for inkjet-printing

Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process

  • Available in different viscosities (adjustable)
  • Suitable in commercial inkjet printing devices
  • Focused on high reliability of droplet generation
  • UV-curable formulations

 

  • Usable as a permanent material for optical application (e.g. lenses, wave guides, optical couplers, diffractive elements, …)
  • Packaging material in the micro electronic
  • Deposition / patterning on substrates with surface topography
  • Imprint material for nano-structuring with high dose accuracy
Element 23weqwf

Nanoimprint Resists

Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.

micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.

Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!

Element 23weqwf

Hybrid Polymers

micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.

OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436

Element 23weqwf

Positive Photoresists

Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography

  • Variety of viscosities for 0.1 µm – 60 µm film thickness in one spin-coating step
  • Effective for broadband, g-line, h-line or i-line exposure, laser direct writing at 350…450 nm and e-beam lithography
  • No post exposure bake
  • Easy removal
     
  • For pattern transfer: Etch mask, mould for electroplating, mould for UV moulding
  • Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. MEMS, LEDs, ICs, MOEMS, fiber optics telecommunications devices, flat panel displays
Element 23weqwf

Negative Photoresists

Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography

  • Effective for broadband and i-line, Deep UV, e-beam exposure, or laser direct writing @ 405 nm
  • Lift-off resists with tunable pattern profile, high temperature stability up to 160 °C
  • Variety of viscosities for different film thicknesses in one spin-coating step
     
  • For pattern transfer: Physical vapour deposition (PVD) and single  layer lift-off, etch mask, mould for electroplating
  • For permanent applications: Polymeric waveguides
  • Use in microsystems technology, microelectronics, micro-optics  – manufacture of e.g. LEDs, ICs, MEMS, flat panel displays, fiber optics telecommunications devices
View all Negativ Photoresists
Element 23weqwf