As in the last years we would like to invite you to the symposium on Direct Write, Optical, Ion and Electron Beam Lithography at the University of Stuttgart, Germany (after Delft 2018 and Vienna 2019).

The symposium features technical experts from Heidelberg Instruments, Nanoscribe, Raith, GenIsys and micro resist technology who will describe the spectrum of latest, state-of-the-art direct-write capabilities. Furthermore, you will get the chance to highlight and/or discuss the latest results in the nanolithography with other experts and application scientist.

Symposium

Date: February 18th - 19th,  2020

Venue: University of Stuttgart
             4th Physics Institute and Research Center SCoPE
             Pfaffenwaldring 57
             70569 Stuttgart, Germany

For more information and for registration please follow the link:

Symposium on Direct Write, Optical, Ion and Electron Beam Lithography