MNE 2018 • 24 - 27 September 2018
What a great show in Copenhagen during the MNE 2018 – the 44th International Conference on Micro- and Nanofabrication and Manufacturing (http://www.mne2018.org/).
We are back from Denmark and got excited by a big bundle of impressions, interesting talks, and of course with a lot of good feedback regarding our products and presentations. Scientists and Engineers of diverse universities, institutes, and high tech companies around the world got the opportunity to present the recent results in micro and nano patterning techniques and their materials. More than 420 talks and posters were presented. 34 exhibitors showed their newest developments, products, and services. The MRT team participated on many levels – in the academic and the commercial discussions.
Not only caused by our presentations during the sessions we again got a high traffic on our booth where we informed the interested community about our newest innovation regarding photoresists, special polymers, UV-curable hybrid polymers and ancillary materials for micro- and nanolithography applications and micro-optics manufacture. Furthermore, micro resist technology gratefully sponsored this year’s MNE Fellow Award to Dr. John Randall from Zyvex Labs, a pioneer in MEMS/NEMS technology and advanced lithography.
© micro resist technology
“Novel concept for the fabrication of individual polymeric hybrid micro-optical components” Johannes Wolf, S. Grützner, M. Ferstl, J. Lawal, A. Schleunitz, G.Grützner
“Efficient fabrication of photonic and optical patterns by imprinting the tailored photo-curable NIL resist - mr-NIL200” Martin Messerschmidt, Manuel W. Thesen, Susanne Grützner, Arne Schleunitz, Gabi Grützner
“Sub-Micron Patterning of Insulating Substrates by Electron Beam Lithography“, V. Passi, D. Schneider, J. Bolten, T. Wahlbrink, Anja Voigt, M. Lemme, M. Möller
“High Speed Production of Microfluidic Systems in Thermoplastics using Roll-to-Roll Extrusion Coating”, R. Taboryski, A. Haase, M. Lohse, M. Thesen, et al.
“Novel functional polymer for on-chip surface enhanced Raman spectroscopy”, R. Blick, I. Fernandez-Cuesta, M. Müller, M. Lohse, M. Thesen, G. Gruetzner
Let us say thank you to all our customers and partners for the interesting talks and inspirations. We are looking forward seeing you next year in MNE 2019 in Rhodes, Greece again, the latest!
Your MRT Team