We are pleased to announce our participation in the International Ultraviolet Association Conference IUVA 2018 in Berlin (Germany), April 22 – 25, 2018 (http://www.iuva.org/BerlinConference ).

You can meet our team at the exhibition, where we will inform about our innovative UV-patternable photoresists and hybrid polymers suitable for the manufacture of non-permanent and permanent patterns, such as for micro-optics and waveguide applications as well as special polymers and ancillary materials for micro- and nanolithography applications.

Oral presentation

As part of the technical conference, micro resist technology will contribute on April 23rd 2018, with the following presentation:

“Innovations in photo-curable materials for fast curing and high quality patterning” by Anja Voigt