Projects»
micro resist technology GmbH

Projekt Number
NMP2-LA-2008-214249
European Large-Scale Framework 7 Project funded by the European Commission as part of the NMP thematic priority

Project duration
1^st May 2008 – 30^th April 2012

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Project objectives
The "Nanopatterning, Production and Applications based on Nanoimprinting Lithography" (NaPANIL) project brings 18 partners together from industry, academia, and private institutes, to achieve ambitious goals targeting on scalable nano-manufacturing processes for arbitrary three-dimensional surfaces with features well below 100 nm in the fields of optical components and life sciences. These processes will enable industrial uptake of new ideas and applications relying on nanotechnology innovations.

Pioneering one of the first collaboration in an EU Consortium in new production technologies, where an industrial pull and a technology push are simultaneously working towards the applications of nanotechnology, the project will:

Establish the processes and technologies needed for the next wave of innovative applications including tools, software, materials and stamp developments

Develop metrology and modelling tools suitable for use in an industrial environment

Research novel ideas to continue building a cycle of innovation-led, high market impact 3D nano-manufacturing based on nanoimprinting lithography (NIL).

To achieve the technological targets set for the project, six technical R&D activity areas have been identified:

Modelling and Design

Metrology and Standards

Processes

Stamps

Materials

Tools

Project benefit
All six subprojects are supporting the development of the manufacturing processes for three Demonstrators:

Planar Diffractive Optical Element

Light Directional Element and

Emissive head-up Display

and the development of longer term exploratory processes. These activities have been combined to form four integrated Subprojects, supported by the Management and the Dissemination/Exploitation activities.

micro resist technology GmbHis developing new resists and materials for preparing transparent working stamps for nanoimprint lithography in this project .

Website: www.napanil.org

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