Projects»
micro resist technology GmbH
Project number
European MEDEA+ integrated project, contract number 13N9215, funded by the Bundesministerium für Bildung und Forschung (BMBF, German Ministry for Education and Research)
www.fantastic-project.org
Project duration
1st March 2007 – 30th September 2009
Project objectives
The FANTASTIC project addresses the development and assessment of UV-nanoimprint lithography (UV‑NIL) for high resolution and high throughput microelectronic applications. Nanoimprint technology has claimed to be a competitive candidate for next generation lithography due to its advantages concerning resolution and cost effectiveness. The project investigates all aspects of the technology involved:
Two CMOS demonstrators are addressed: (1) patterning of a contact hole layer and (2) printing of via and metal layers using a 3D template. Main equipments suppliers, maskshops, and institutes involved in nanoimprint activities are partners of the project. The assessment of the technology will be driven by the leading European IC manufacturers.
The contribution of micro resist technology as a material supplier within FANTASTIC is the development of suitable UV-curable NIL resists and provide them to the partners. The resist development is guided by process requirements of microelectronic manufacturing and detailed specifications defined within the project. Particularly low defect rates are important.
Project benefit
The strategic task of the FANTASTIC project is the comprehensive assessment of the nanoimprint lithography as an alternative patterning technology in comparison to immersion lithography and other next generation lithographies like EUV lithography. Strengthening the European industry and research in the field of nanolithography and establishment of industrial process lines are main objectives.
For micro resist technology GmbH the most important result is the development of a new UV-NIL polymer with improved imprint properties. It has been already introduced by the name mr-UVCur21 . Compared to the former product mr UV-Cur21 shows better performance with respect to pattern filling during imprinting, UV curing, and plasma etching. By close collaboration with project partners this polymer system was comprehensively characterised in UV imprint and dry etching tests. Additionally suitable ancillaries were developed, like diluent and adhesion promoter for Si and SiO2 substrates. The most important parameters to be optimised for the UV-NIL polymer systems were minimum UV dose, reduction of release forces, release agent additives in the polymer, potential interactions with anti-sticking layer on the stamp, adhesion issues, and plasma etching behaviour.
Outlook
The adaptation of the UV-NIL resists to commercial imprint tools guarantees beneficial imprint results for the customers. micro resist technology GmbH could further extend its comparably broad range of NIL materials. The comprehensive characterisation of the materials in the project provides a good fundament for future developments, e.g. for new NIL applications or special customer requests. Apart from that new customers can be found due to the close collaboration with NIL tool manufacturers.
