• Contact
  • micro resist technology GmbH
  • Koepenicker Str. 325
  • 12555 Berlin
  • GERMANY
  • phone   +49 30 64 16 70 100
  • fax       +49 30 64 16 70 200
  • mail   sales@microresist.de
  • Contact Form
  • Your Message ›››
    •
  • Order Form
  • Your Order ›››
    •
  • Distributors
  • South Korea ›››
  • USA ›››
  • Italy ›››
  • Japan ›››
  • UK & Ireland ›››
  • Israel ›››
  • Taiwan ›››
    •
  • Download Service
  • FAQs ›››
  • Catalogues/ Flyer ›››
  • Newsletter ›››
    •

     

    Products »
    micro resist technology GmbH

     Positive Tone Photoresist Series      » ma-P 1275 and 1275 HV «

    Currently available products

    » ma-P 1200

    » PDF ›  ma-P 1275 and ma-P 1275 HV

    Unique features


  • Film thickness of up to 60 µm in one spin-coating step
  • Specifically designed for electroplating of structures in microsystems technology
  • High stability in acid and alkaline plating baths
  • Well suitable also for the use as an etch mask exhibiting good dry and wet etch resistance
  • Aqueous alkaline development
  • Easy removal
  • Side wall angle up to 87° with mask aligner broadband exposure
    •

    Applications


  • Mould for electroplating e.g.:
  • Micro coils
  • Micro springs
  • Micro optical components
    •
  • Etch mask for metal and semiconductor substrates e.g.:
  • Microlenses from reflowed patterns
    •
  • Mask for ion implantation
    •

    Process flow


    Examples

    ma-P 1275 and ma-P 1275 HV

    50 µm
    ma-P 1275 HV

    image1_1275hv

    40 µm
    electroplated Ni

    image2_1275hv

    Reflowed ma-P 1275 pattern transfered into OrmoComp

    image3_1275hv

    print version ›››    print version
    ˆ back to top ˆ