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    Products »
    micro resist technology GmbH

     Polymers for UV-based Nanoimprint Lithography

    Currently available products

    ...for UV-based NIL

    » mr-UVCur21 und mr-UVCur06

    » mr-UVCur21SF


    Product parameter overview

    Polymers Thickness
    (3000 rpm)
    Wavelength Resolution
    Anwendung als Ätzmaske für die Strukturübertragung
    mr-UVCur06
    -
    280 – 450 nm **    50 nm
    mr-UVCur21-100 nm 100 nm 280 – 450 nm ** ≤ 30 nm
    mr-UVCur21-200 nm 200 nm 280 – 450 nm ** ≤ 30 nm
    mr-UVCur21-300 nm 300 nm 280 – 450 nm ** ≤ 30 nm
    mr-UVCur21SF 1.6 µm 280 – 450 nm ** ≤ 30 nm

    Other thicknesses on demand.
    ** Compatible with different UV lamps and filtersystems

    Ancilleries

    Polymers Thinner Adhesion promoter
    mr-UVCur06 ma-T 1070 mr-APS1
    mr-UVCur21-Series ma-T 1070 mr-APS1
    mr-UVCur21SF
    -
    mr-APS1


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