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    Products»
    micro resist technology GmbH

     Polymers for Nanoimprint Lithography  »mr-I 9000E«

    Currently available products

    ...for thermal NIL

    » mr-I 7000E & mr-I 8000E

    » mr-NIL 6000

    » mr-I 9000E

    » mr-I PMMA

    » mr-I T85

    » als PDF › mr-I 9000M

    ...for UV-based NIL

    » mr-UVCur21 and mr-UVCur06

    Details of product   » mr-I 9000E «

    Unique features


  • Excellent film quality
  • Tg 35 °C (before curing) 
  • Nearly isothermal imprint process::
  • Imprint temperature 120 °C
  • Mould release at 100 °C
    •
  • Curing and increase in Tg to Tg,cured
    during imprint
  • Imprint pressure 50 bar
  • Very low residual layer thickness
    down to 5 nm
  • Excellent pattern transfer fidelity
  • Plasma etch resistance comparable
    to conventional novolak-based photoresists
  • Attainable smallest feature size
    at least 50 nm
    (depending on mould resolution)
  • Ready-to-use solutions
  • Safe solvents
    •

    Applications


  • Coating of various substrate materials,
    e.g. Si, SiO2, Al
  • Mask for pattern transfer processes
  • Dry and wet etching
  • Single and multilayer systems
    •

    Process flow


    Examples

    mr-I 9000E

    100 nm trenches,
    300 nm distance

    200 nm
    dots

    200 nm
    lines


    print version ›››    print version
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