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    Products»
    micro resist technology GmbH

     Polymers for Nanoimprint Lithography  »mr-I 7000R & mr-I 8000R«

    Currently available products 


    Details of product  » mr-I 7000R & 8000R «

    Unique features


  • Excellent properties for thermal NIL
    - Short cycle times due to very fast
      polymer flow
    - Sub-20 nm resolution
    - Low residual layer thickness
    - Very low release forces beneficial
      for easy demoulding
  • Longer life-time of anti-sticking layers
    on the mould
  • High plasma etch resistance comparable to
    novolak-based photoresists
  • Applications


  • Etch mask for pattern transfer
  • Fabrication of nanopatterns for
    - High brightness LEDs
    - Photonic crystals
    - Data storage with patterned media
    - Nano-optical devices, sub-wavelength
      optical elements
    - Microfluidics, bio applications

  • Process flow



    Examples

    mr-I 7000R & mr-I 8000R

    12 nm trenches,
    50 nm pitch, imprinted in
    in mr-I 7000R
    (Courtesy of Eulitha and
    Paul Scherrer Institute)

    Examples mr-I 7000R and 8000R

    75 nm and 100 nm
    squares imprinted
    in mr-I 7030R


    Examples mr-I 7000R and 8000R

    75 nm and 100 nm
    lines imprinted
    in mr-I 8030R,
    varying pitch

    Examples mr-I 7000R and 8000R



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