Products»
micro resist technology GmbH
Polymers for Nanoimprint
Lithography »mr-I 7000E & mr-I 8000E«
Currently available products
...for UV-based NIL
Details of product » mr-I 7000E & 8000E «
Unique features
Imprint characteristics
superior to mr-I 7000
and mr-I 8000 polymers
Process flow
Examples
mr-I 7000E & mr-I 8000E
100 nm trenches, 300 & 500 nm distance
thickness 200 nm
embossing conditions:
130 °C, 3 min, 50 bar
100 nm trenches,
300 nm distance
thickness 200 nm
embossing conditions:
190 °C, 3 min, 50 bar
mr-I 7000E
130 °C,
3 min,
20 bar
no defects
print
version ››› 
ˆ
back to top ˆ