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micro resist technology GmbH

Currently available products

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OrmoComp – direct laser writing as an alternative patterning method

 

Microstructures made from OrmoComp fabricated with 3D laser lithography system.
Form and geometry of the structures can be chosen freely in the two-photon absorption fabrication process. (Courtesy of Nanoscribe GmbH)
Processing laser wavelength: 780 nm
Substrate: glass

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Product parameter - Overview

Polymer	Thickness (3000 rpm)	Developer	Thinner	Adhesion Promoter
OrmoComp	20 µm	OrmoDev	OrmoThin ma-T 1050*	OrmoPrime08
OrmoStamp	10 µm	OrmoDev	OrmoThin ma-T 1050*	OrmoPrime08
OrmoCore	20 µm (ambient atmosphere)	OrmoDev	OrmoThin ma-T 1050*	OrmoPrime08
OrmoClad	16 µm (ambient atmosphere)	OrmoDev	OrmoThin ma-T 1050*	OrmoPrime08
OrmoClear	15 µm (ambient atmosphere)	OrmoDev	OrmoThin ma-T 1050*	OrmoPrime08
OrmoClear10	31 µm (ambient atmosphere)	OrmoDev	OrmoThin ma-T 1050*	OrmoPrime08
OrmoClear30	75 µm (ambient atmosphere)	OrmoDev	OrmoThin ma-T 1050*	OrmoPrime08

* for Thicknesses > 500 nm
All inorganic-organic hybrid polymers listed in the table are UV patternable.
Do you wish a different viscosity or photo initiator kind/amount?
Customised products on demand available »Link to Order Form«

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