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    Products»
    micro resist technology GmbH

     Negativ Tone Photoresist Series       » ma-N 400 «

    Currently available products

    » PDF › ma-N 400

    » ma-N 1400

    » ma-N 2400

    » EpoCore/EpoClad

    Details of product   » ma-N 400 «

    Negativ Tone Photoresist Series for UV-lithography Structure for conventional transmission processes and the lift-off process

    Unique features


  • High wet and dry etch resistance
  • Good thermal stability of the resist pattern
  • Tunable pattern profil: vertical to undercut
  • Aqueous alkaline development
  • Easy to remove
  • Based on safe solvents
  • Resists available in a variety of viscosities
    •

    Applications


  • Microelectronics and micro systems
    technology
  • Mask for lift-off processes
  • Etch mask for semiconductors and
    metals
  • Well suitable for implantation
    •

    Standard and Lift-off process


    Examples

    ma-N 400, 2 µm thickness

    tE 90 s,0 µm
    undercut

    tE 100 s,0,5 µm
    undercut

    tE 140 s,1,5 µm
    undercut

    print version ›››    print version
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