In nanoimprint lithography (NIL) the mould release has to be defect-free and requires low release forces. The new polymer series mr-I 7000R and mr-I 8000R for thermal nanoimprinting fulfil these requirements better than other materials before. Their recipes have been developed with the focus on excellent release properties and minimum release forces.


images mr-I 7000R and ma-I 8000R
The thermoplastic polymers mr-I 7000R and mr-I 8000R (Tg 50 °C and 105 °C) can be applied in nanoimprint processes as etch masks for the production of nanopatterns. The fields of applications are data storage, high-brightness LEDs, displays, or micro- and nano-optical elements. Their excellent nanoimprint behaviour and high plasma etch resistance particularly enable short cycle times and high pattern transfer fidelity. The improved release properties ease the structuring of challenging small structures with a resolution below 50 nm.