Archive »
micro resist technology GmbH

---

	Newsletter Archive
	News 2006/2 PDF »		micro resist technology GmbH coordinates NaPa subproject „Materials“. mr-NIL 6000 – high performance photochemically curing resist for thermal Nanoimprint Lithography. mr-I T85 – New thermoplastic polymer series for NIL. 3-D lithography for micro machining.
	News 2006/1 PDF »		Fast curing polymer for UV-based nanoimprint lithography. Ormocomp, the trusted product from the Ormocer®s family, doesn‘t exhibit yellowing any more. ma-N 400/ ma-N 1400 - single layer negative photoresists for lift-off processes. High viscosity resist for pattern transfer processes at room temperatures.
	News 2005/2 PDF »		New thermoplastic polymers mr-I 7000E and mr-I 8000E with improved imprint behaviour. New thermally curing polymer mr-I 9000E with improved imprint behaviour. EpoCore and EpoClad are chemically amplified negative tone photoresists with high sensitivity to UV and X-ray exposure. Ormoprime is a new adhesion promoter for our ORMOCER® product line.
	News 2005/1 PDF »		Thermoplastic polymers for thermal nanoimprint lithography. Thermosetting polymers for nanoimprint lithography. Photochemically curing polymer for thermal nanoimprint lithography. Fast curing polymer for UV-based nanoimprint lithography.

---

^® Registered trademark of the Fraunhofergesellschaft zur Förderung der Angewandten Forschung in Deutschland e.V

---